Template:LithRecipe Table: Difference between revisions

Revision as of 14:59, 21 August 2012

| width="100" bgcolor="#DAF1FF" | Suss Aligners | width="100" bgcolor="#DAF1FF" | Contact Aligner | width="100" bgcolor="#DAF1FF" | Stepper 1
(GCA 6300) | width="100" bgcolor="#DAF1FF" | Stepper 2
(AutoStep 200) | width="100" bgcolor="#DAF1FF" | Stepper 3
(ASML DUV) | width="100" bgcolor="#DAF1FF" | DUV Flood | width="175" bgcolor="#DAF1FF" | Field Emission SEM 1
(FEI Sirion) | width="175" bgcolor="#DAF1FF" | E-Beam Lithography System
(JEOL JBX-6300FS)

@@ Line 1: / Line 1: @@
-| width="65" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Suss Aligners (SUSS MJB-3)|Suss Aligners]]
+| width="100" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Suss Aligners (SUSS MJB-3)|Suss Aligners]]
-| width="65" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Contact Aligner (SUSS MA-6)|Contact Aligner]]
+| width="100" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Contact Aligner (SUSS MA-6)|Contact Aligner]]
 | width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 1 (GCA 6300)|Stepper 1<br>(GCA 6300)]]
 | width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 2 (AutoStep 200)|Stepper 2<br>(AutoStep 200)]]
 | width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 3 (ASML DUV)|Stepper 3<br>(ASML DUV)]]
-| width="30" bgcolor="#DAF1FF" | [[Flood_Exposure_Recipes#DUV Flood Expose|DUV Flood]]
+| width="100" bgcolor="#DAF1FF" | [[Flood_Exposure_Recipes#DUV Flood Expose|DUV Flood]]
 | width="175" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#Field Emission SEM 1 (FEI Sirion)|Field Emission SEM 1<br>(FEI Sirion)]]
 | width="175" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#E-Beam Lithography System (JEOL JBX-6300FS)|E-Beam Lithography System<br>(JEOL JBX-6300FS)]]