Lithography Recipes: Difference between revisions
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*{{fl|PMMA-E-Beam-Resist-Datasheet.pdf|PMMA (PMMA, P(MMA-MAA) copolymer)}} |
*{{fl|PMMA-E-Beam-Resist-Datasheet.pdf|PMMA (PMMA, P(MMA-MAA) copolymer)}} |
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*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}} |
*{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}} |
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;Nanoimprinting |
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*{{fl|NX1020-Nanoimprinting-Datasheet.pdf|NX1020}} |
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*{{fl|MRI-7020-Nanoimprinting-Datasheet.pdf|MRI-7020}} |
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;Contrast Enhancement Materials |
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*{{fl|CEM365iS-Contrast-Enhancement-Datasheet.pdf|CEM365iS}} |
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;Anti-Reflection Coatings |
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*{{fl|XHRiC-Anti-Reflective-Coating.pdf|XHRiC}} |
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;Developers |
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*{{fl|AZ400K-Developer-Datasheet.pdf|AZ400K (AZ400K, AZ400K1:4)}} |
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*{{fl|AZ300MIF-Developer-Datasheet.pdf|AZ300MIF}} |
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;Photoresist Removers |
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*{{fl|1165-Resist-Remover.pdf|1165}} |
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*{{fl|AZ300T-Resist-Remover.pdf|AZ300T}} |
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*{{fl|PRX-127-Resist-Remover.pdf|PRX-127}} |
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==Recipes== |
==Recipes== |
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Revision as of 00:10, 9 November 2012
Lift-Off Techniques
Chemical Datasheets
| To Do: Ask Brian where these should go... |
- Positive Photoresists
- AZP4000 (AZ4110, AZ4210, AZ4330)
- OCG825
- SPR220 (SPR220-2, SPR220-7)
- SPR950-0.8
- SPR955CM (SPR955CM-0.9, SPR955CM-1.8)
- Negative Photoresists
- Underlayers
- E-beam resists
- Nanoimprinting
- Contrast Enhancement Materials
- Anti-Reflection Coatings
- Developers
- Photoresist Removers
Recipes
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.