ICP Etching Recipes: Difference between revisions
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===InP Etch === |
===InP Etch === |
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*[[media:UNAXIS-VLR-InP-Etch-200C-Recipe.pdf|InP Etch Recipe (200C)]] |
*[[media:UNAXIS-VLR-InP-Etch-200C-Recipe.pdf|InP Etch Recipe (200C)]] |
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*[[media:|InP Etch Profile (200C)]] |
*[[media:|InP-based Material Etch Profile (200C)]] |
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===InP Etch (H<sub>2</sub> Ar)=== |
===InP Etch (H<sub>2</sub> Ar)=== |
Revision as of 17:40, 3 October 2013
Back to Dry Etching Recipes.
Si Deep RIE (PlasmaTherm/Bosch Etch)
Single-step Si Etching (not Bosch Process!) (Si Deep RIE)
ICP Etch 1 (Panasonic E626I)
SiO2 Etching (Panasonic 1)
Al Etch (Panasonic 1)
Cr Etch (Panasonic 1)
Ti Etch (Panasonic 1)
AlGaAs Etch (Panasonic 1)
GaN Etch (Panasonic 1)
ICP Etch 2 (Panasonic E640)
SiO2 Etching (Panasonic 2)
Al Etch (Panasonic 2)
GaAs Etch (Panasonic 2)
ICP-Etch (Unaxis VLR)
GaAs Etch
AlGaAs Etch
InP Etch (Unaxis VLR)
InP Etch
- InP Etch Recipe (200C)
- [[media:|InP-based Material Etch Profile (200C)]]