Revision as of 18:06, 6 November 2013

Compound Semiconductor Etching

Material	Etchant	Rate (nm/min)	Anisotropy	Selective to	Selectivity	Ref.	Notes	Confirmed by	Header text
InP	Example	Example	Example	Example	Example	Example	Example	Example	Example
GaAs	Example	Example	Example	Example	Example	Example	Example	Example	Example
GaN	Example	Example	Example	Example	Example	Example	Example	Example	Example

@@ Line 1: / Line 1: @@
 =Compound Semiconductor Etching=
+{| class="wikitable sortable"
+|-
+! Material !! Etchant !! Rate (nm/min) !! Anisotropy !! Selective to !! Selectivity !! Ref. !! Notes !! Confirmed by !! Header text
+|-
+| InP|| Example || Example || Example || Example || Example || Example || Example || Example || Example
+|-
+| GaAs|| Example || Example || Example || Example || Example || Example || Example || Example || Example
+|-
+| GaN|| Example || Example || Example || Example || Example || Example || Example || Example || Example
+|}
 =Metal Etching=