Photoresist Spin Coat Benches

Photoresist Spin Coat Benches Tool Type Wet Processing Location ? Supervisor Aidan Hopkins Supervisor Phone (805) 893-2343 Supervisor E-Mail hopkins@ece.ucsb.edu Description Custom Photoresist Spin Coat Bench Manufacturer Pure Aire Corporation

About

The facility contains 3 stainless steel solvent benches for photoresist spin coating. The benches consist each of 2 integrated Headway PWM32 series photoresist spinners. Overhead and foot controls are provided. 8 preprogrammed recipes and 2 user-programmable recipes are offered. Automatic wafer lifting and centering stations are offered for spinning large wafers up to 8” in diameter. 6” or 8” Cee ultra-flat hotplates with 0.1°C temperature stability are preset for standard resist bake temperatures (90, 95, 100, 105, 110, 115°C). Other user-changeable hot plates are also provided. Nitrogen guns are also on both sides of the bench. Large resist bottles are stored in a refrigerator amd small user bottles are stored by group in a ventilated steel cabinet. Waste pipets and resist soaked wipes are collected for disposal. A list of stocked resists appears on the lithography processing web page. Other chemicals should be OK'd by laboratory staff prior to use in the laboratory.

Deatailed Specifications

• 2 Headway PWM32 spinners per bench, multi-step programming
• 8 preset spin programs, 2 user defineable
• Variety of wafer chucks for 5 mm x 5 mm pieces to 6” wafers
• Lifters for large wafer centering
• Preset 0.1°C stable, ultra-flat hotplates (90, 95, 1100, 105, 110, 115°C)
• NO WAX on hotplates
• Other hotplates for user defined temperatures
• Hepa filtered laminar flow for Class 100
• Manual dispense of resist; particle filtering available