File:SEM Image.png

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Wafer had UV6 or UVN30 as mask. 5min Si etch followed by PostBARC Etch/PR Strip (STD)_V2 with 2min over etch

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	18:47, 28 January 2025		1,500 × 603 (706 KB)	Gopimeena (talk \| contribs)

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Horizontal resolution	59.05 dpc
Vertical resolution	59.05 dpc