Lithography Recipes

Lift-Off Techniques

• Description/Tutorial
• Bi-Layer Process with PMGI Underlayer and Contact Aligner

Recipes

• R = Recipe is available. Clicking this link will take you to the recipe.
• A = Material is available for use, but no recipes are provided.

Lithography Recipes
	Contact Aligners		Steppers			Flood Expose	E-Beam Lithography
Positive Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
AZ4110	R1	R1
AZ4210	R1	R1
AZ4330RS	R1	R1
OCG 825-35CS
SPR 950-0.8
SPR 955 CM-0.9
SPR 955 CM-1.8
SPR 220-3.0	R1	R1
SPR 220-7.0	R1	R1
THMR-IP3600 HP D
UV6-0.7
Negative Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
AZ5214-EIR	R1	R1
AZnLOF 2020	R1	R1
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510
UVN30-0.5
SU-8 2015
Underlayers	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
PMGI SF-11
PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
CEM-365 IS
E-Beam Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
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Nanoimprint Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
MR-I 7020
Nanonex NX-1020
	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)