ICP Etching Recipes
From UCSB Nanofab Wiki
Revision as of 20:16, 20 August 2012 by
Zwarburg
(
talk
|
contribs
)
(
diff
)
← Older revision
|
Latest revision
(
diff
) |
Newer revision →
(
diff
)
Jump to navigation
Jump to search
Back to
Dry Etching Recipes
.
Contents
1
ICP Etch 1 (Panasonic E626I)
1.1
SiO
2
Vertical Etch (Panasonic 1)
2
ICP Etch 2 (Panasonic E640)
2.1
SiOx Vertical Etch (Panasonic 2)
3
ICP-Etch (Unaxis VLR)
3.1
InP Etch (Unaxis VLR)
3.1.1
InP Etch
3.1.2
InP Etch (H
2
Ar)
ICP Etch 1 (Panasonic E626I)
SiO
2
Vertical Etch (Panasonic 1)
SiO
2
Vertical Etch Recipe
ICP Etch 2 (Panasonic E640)
SiOx Vertical Etch (Panasonic 2)
SiOx Vertical Etch Recipe
ICP-Etch (Unaxis VLR)
InP Etch (Unaxis VLR)
InP Etch
InP Etch Recipe (200C)
InP Etch (H
2
Ar)
InP Etch Recipe (H
2
Ar 200C)
Category
:
Recipes
Navigation menu
Personal tools
Create account
Log in
Namespaces
Page
Discussion
English
Views
Read
View source
View history
More
Search
InvisibleMenu
QuickLinks
Lab Rules
Common Questions/FAQ
Staff List
Equipment Signup
Chemicals + MSDS
Equipment
Full Tool List
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
Packaging
Metrology & Test
Recipes and Data
Lithography
Vacuum Deposition
Dry Etching
Wet Etching
Thermal Processing
Packaging Tools
Data + Info
Process Control Data
Calculators/Utilities
NanoFab Info
Research + Pubs
Tech Talks
Tools
What links here
Related changes
Special pages
Printable version
Permanent link
Page information