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- ...ransistors and Template Assisted Selective Epitaxy.pdf|THz Transistors and Template Assisted Selective Epitaxy - Brian Markman - Rodwell Group - UCSB - Sept. 2535 bytes (78 words) - 15:17, 30 October 2019
- ...ransistors and Template Assisted Selective Epitaxy.pdf|THz Transistors and Template Assisted Selective Epitaxy - Brian Markman}}1 KB (187 words) - 07:30, 12 March 2021
- ===[[Template:Publications|Select Publications]]===3 KB (371 words) - 17:49, 16 February 2023
- ...) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB Gain4" (measuring small particl #** (Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gain4)2 KB (339 words) - 11:31, 22 April 2020
- ...the vendor to insert your 1x (wafer-scale) design into the appropriate GCA template and they can add a barcode. ....edu/w/images/c/c4/GCA_Stepper_MaskPlate_Master-DarkField_5x.gds Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)]7 KB (1,123 words) - 14:44, 4 January 2024
- ....edu/w/images/c/c4/GCA_Stepper_MaskPlate_Master-DarkField_5x.gds Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)] **''This template is designed to be submitted to the photomask vendor to print as-is, no scal5 KB (693 words) - 17:43, 12 February 2024
- *[[Media:GCA Stepper MaskPlate Master-DarkField 5x.gds|Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)]] **''This template is designed to be submitted to the photomask vendor to print as-is, no scal6 KB (893 words) - 17:44, 12 February 2024
- *[[Media:Vernier Template.gds|Alignment/Registration Vernier Scales (GDS)]] - used to measure the mis ...t=screenshot of vernier_template.gds CAD file|none|thumb|200x200px|Vernier Template schematic.]]16 KB (2,392 words) - 21:28, 15 May 2024
- Note: if you chose a “Small” substrate template, the system always moves the sample under the '''overview camera''' at firs ...Series exposure (focus-exposure matrix, FEM), you can choose the "_Manual" template during <u>Setup</u>, and on the <u>Expose</u> screen you can edit the Serie15 KB (2,452 words) - 10:59, 5 June 2024
- ...otech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Template Guidelines] ''- Choosing the right settings for your substrate size - CRITI6 KB (901 words) - 10:34, 26 January 2024
- ...ed, at wafer-scale (1X), and they'll scale it up 4x and insert it into the template.10 KB (1,725 words) - 14:11, 22 September 2023
- **This etch is detailed in the following article: [[Template:Publications#Highly Selective and Vertical Etch of Silicon Dioxide using Ru **''This etch is used in the following publication:'' [[Template:Publications#Highly Selective and Vertical Etch of Silicon Dioxide using Ru28 KB (4,356 words) - 12:49, 7 May 2024
- ...) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB Gain4" (measuring small particl #**Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gain433 KB (5,424 words) - 17:05, 4 January 2024
- |Template assisted selective epitaxy of InP via MOVPE towards horizontal heterojunct |Towards Horizontal Heterojunctions for Tunnel Field Effect transistors with Template Assisted Selective Epitaxy via MOCVD77 KB (11,491 words) - 16:10, 27 November 2019