Unused files

The following files exist but are not embedded in any page. Please note that other websites may link to a file with a direct URL, and so may still be listed here despite being in active use.

Showing below up to 50 results in range #351 to #400.

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  51-SiNx-Etch-Recipe-using-RIE3.pdf ; 1.07 MB
  
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  EDAX - Genesis Spectrum -Users Manual.pdf ; 1.81 MB
  
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  Adv PECVD-LS Nitride2 300C standard recipe .pdf ; 379 KB
  
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  Sputter5 SiO2 2017 SiO2 film.pdf ; 86 KB
  
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  Thermal evaporator 2 Sheet1.pdf ; 31 KB
  
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  Thermal evaporator 2.pdf ; 20 KB
  
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  Pt-Sputter4-3mT-50W-360s.pdf ; 722 KB
  
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  Pt-Sputter4.pdf ; 1.21 MB
  
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  TiW-Sputter4-4.5mT-300W-300s.pdf ; 957 KB
  
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  Au-Sputter4-5mT-200W-120s.pdf ; 688 KB
  
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  Al-Sputter4-5mT-200W-30m.pdf ; 229 KB
  
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  Lower-Etch-Rate InP Etch using Unaxis PM1 tool at 200 C.pdf ; 1.05 MB
  
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  Arrowleft1.jpeg 225 × 225; 2 KB
  
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  SiNx Films by PECVD2.pdf ; 125 KB
  
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  TiO2 film using Sputter4.pdf ; 1.45 MB
  
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  Beneficial Nanofab lab time policy.docx ; 15 KB
  
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  AdvPECVD-LS Nitride2 300C standard recipe LS Nitride2 standard recipe.pdf ; 380 KB
  
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  New AdvPECVD-LS Nitride2 300C standard recipe LS Nitride2 standard recipe.pdf ; 380 KB
  
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  SignupMonkey - Add to Calendar - Screen Shot 2017-11-30 at 3.55.10 PM.png 300 × 182; 45 KB
  
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  10-Si Etch Bosch DSEIII.pdf ; 616 KB
  
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  10-Si Etch Single Step Smooth Sidewall DSEIII.pdf ; 1.63 MB
  
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  Testtt.jpeg 1,024 × 1,024; 77 KB
  
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  Brian Markman - Al2O3 ICP2 Etch Rates 2018.pdf ; 19 KB
  
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  Sputter 3 - height conversion v1.PNG 937 × 539; 26 KB
  
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  ASML Stepper 3 - Field Sizes - Screen Shot 2018-02-21 at 1.40.22 PM.png 481 × 490; 45 KB
  
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  Toppan UCSB quotation 041116.pdf ; 316 KB
  
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  Cu Film using Sputter-3.pdf ; 153 KB
  
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  Home Feed - ResearchGate.pdf ; 1.89 MB
  
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  Wiki Operational Procedure EB4 With EBC Rev 3.pdf ; 1,000 KB
  
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  AZ NMP RINSE MSDS.pdf ; 285 KB
  
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  SiO2-Mask Etch Recipe for Unaxis Cl2 Etch.pdf ; 446 KB
  
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  UV Ozone Manual Jelight M-144AX.pdf ; 347 KB
  
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  Test.pdf ; 8 KB
  
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  Nanofab Policies Chemical Hygiene Plan 8 31 18.pdf ; 1.76 MB
  
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  Process Notes for Users.pdf ; 871 KB
  
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  Holography Process for 1D-lines and 2D-dots (ARC-11 & THMR-IP3600HP-D)-updated-8-13-2018-A.pdf ; 243 KB
  
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  VeecoNanoman.jpg 1,024 × 682; 158 KB
  
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  IP180909.pdf ; 59 KB
  
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  STD LSNitride2 recipe new info.pdf ; 37 KB
  
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  STD LSNitride2 recipe new info 1-2-2019 Dep.recipe.pdf ; 349 KB
  
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  STD LSNitride2 12-14-18 recipe.pdf ; 349 KB
  
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  18.pdf ; 400 KB
  
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  STD LSNitride2 5-9-18.pdf ; 400 KB
  
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  STD Nitride 5-9-18.pdf ; 209 KB
  
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  STD Nitride 5-9-18 Dep.recipe.pdf ; 209 KB
  
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  STD Oxide 5-9-18 Dep.recipe.pdf ; 238 KB
  
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  STD SiO2 5-9-18.pdf ; 239 KB
  
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  User Percentages by Discipline 2018.png 797 × 873; 61 KB
  
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  SiO2 Etch using ICP2-no O2-a.pdf ; 55 KB
  
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  SiO2 Etch using ICP2 with O2-a.pdf ; 52 KB