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- This template inserts a "Tool Info" panel into a page, including a tool photo, supervisor Copy/paste the following code to include this template in a page. Preferably inserted at the top of the page.10 KB (1,365 words) - 21:57, 2 August 2022
- ...the vendor to insert your 1x (wafer-scale) design into the appropriate GCA template and they can add a barcode. ....edu/w/images/c/c4/GCA_Stepper_MaskPlate_Master-DarkField_5x.gds Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)]7 KB (1,123 words) - 14:44, 4 January 2024
- ....edu/w/images/c/c4/GCA_Stepper_MaskPlate_Master-DarkField_5x.gds Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)] **''This template is designed to be submitted to the photomask vendor to print as-is, no scal5 KB (710 words) - 11:27, 27 September 2024
- This template contains Staff Contact Info (phone, email etc), which is <u><b>inserted int To edit the Supervisor info, you must edit this template in <tt><u><b>Edit Source</b></u></tt> mode.4 KB (556 words) - 22:37, 2 August 2022
- ===''[[Template:News_-_Older_Articles|See older articles at this link]]''===5 KB (725 words) - 16:52, 23 September 2024
- ...-level designs, and instruct the vendor to magnify by 5x/4x, insert into a template for the specified stepper (tell them the model), and they can do the rest. ...files for, you can optionally do the 5x magnification and insert into the template file yourself if desired.8 KB (1,216 words) - 11:32, 27 September 2024
- *[[Media:GCA Stepper MaskPlate Master-DarkField 5x.gds|Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)]] **''This template is designed to be submitted to the photomask vendor to print as-is, no scal6 KB (928 words) - 11:27, 27 September 2024
- *[[Media:Vernier Template.gds|Alignment/Registration Vernier Scales (GDS)]] - used to measure the mis ...t=screenshot of vernier_template.gds CAD file|none|thumb|200x200px|Vernier Template schematic.]]17 KB (2,487 words) - 11:49, 17 September 2024
- Note: if you chose a “Small” substrate template, the system always moves the sample under the '''overview camera''' at firs ...Series exposure (focus-exposure matrix, FEM), you can choose the "_Manual" template during <u>Setup</u>, and on the <u>Expose</u> screen you can edit the Serie15 KB (2,452 words) - 10:59, 5 June 2024
- ...otech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Template Guidelines] ''- Choosing the right settings for your substrate size - CRITI6 KB (901 words) - 10:34, 26 January 2024
- [[Bill_Mitchell|Dr. Bill Mitchell]] recently published an article detailing [[Template:Publications#Highly_Selective_and_Vertical_Etch_of_Silicon_Dioxide_using_Ru9 KB (1,258 words) - 14:58, 31 August 2021
- ...ed, at wafer-scale (1X), and they'll scale it up 4x and insert it into the template.10 KB (1,725 words) - 14:11, 22 September 2023
- **This etch is detailed in the following article: [[Template:Publications#Highly Selective and Vertical Etch of Silicon Dioxide using Ru **''This etch is used in the following publication:'' [[Template:Publications#Highly Selective and Vertical Etch of Silicon Dioxide using Ru26 KB (4,124 words) - 17:13, 13 September 2024
- [[Bill_Mitchell|Dr. Bill Mitchell]] recently published an article detailing [[Template:Publications#Highly_Selective_and_Vertical_Etch_of_Silicon_Dioxide_using_Ru10 KB (1,466 words) - 13:21, 14 August 2024
- ...) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB Gain4" (measuring small particl #**Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gain433 KB (5,424 words) - 17:05, 4 January 2024
- |Template assisted selective epitaxy of InP via MOVPE towards horizontal heterojunct |Towards Horizontal Heterojunctions for Tunnel Field Effect transistors with Template Assisted Selective Epitaxy via MOCVD77 KB (11,491 words) - 16:10, 27 November 2019