PECVD Recipes

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

Historical Particulate Data

• Particulates(Gain4) in PECVD#1-OLD DATA 2015
• Particulates(Gain4) in PECVD#1-OLD DATA 2016
• Particulates(Gain4) in PECVD#1-OLD DATA 2017
• Particulates in PECVD#1 films 2017
• Particulates in PECVD#1 films 2018
• Particulates in PECVD#1 films 2019
• Particulates in PECVD#1 films 2020

SiN deposition (PECVD #1)

• SiN Standard Recipe
• Table Si3N4 recipe

Historical Data

Thin-Film Properties

• SiN 100nm Data 2014
• SiN 100nm Data 2015
• SiN 100nm Data 2016
• SiN 100nm Data 2017
• SiN 300nm Data 2017
• SiN 300nm Data 2018
• SiN 300nm Data 2019
• SiN 300nm Data 2020

Uniformity Data

• SiN 100 nm Thickness uniformity 2014
• SiN 100 nm Thickness uniformity 2015
• SiN 100 nm Thickness uniformity 2016
• SiN 100 nm Thickness uniformity 2017
• SiN 300nm Thickness uniformity 2017
• SiN 300nm Thickness uniformity 2018
• SiN 300nm Thickness uniformity 2019
• SiN 300nm Thickness uniformity 2020

SiO₂ deposition (PECVD #1)

• SiO₂ Standard Recipe
• Table SiO2 recipe

Historical Data

Thin-Film Properties

• SiO₂ 100nm Data 2014
• SiO₂ 100nm Data 2015
• SiO₂ 100nm Data 2016
• SiO₂ 100nm Data 2017
• SiO₂ 300nm Data 2017
• SiO₂ 300nm Data 2018
• SiO₂ 300nm Data 2019
• SiO₂ 300nm Data 2020

Uniformity Data

• SiO₂ 100nm Thickness uniformity 2014
• SiO₂ 100 nm Thickness uniformity 2015
• SiO₂ 100 nmThickness uniformity 2016
• SiO₂ 100nm Thickness uniformity 2017
• SiO₂ 300nm Thickness uniformity 2017
• SiO₂ 300nm Thickness uniformity 2018
• SiO₂ 300nm Thickness uniformity 2019
• SiO₂ 300nm Thickness uniformity 2020

Low-Stress SiN - LS-SiN (PECVD#1)

• LS SiN Standard Recipe
• LS SiN Data 2014
• LS SiN 1000A Thickness uniformity 2014

SiO_xN_y deposition (PECVD #1)

• SiO_xN_y Standard Recipe
• SiO_xN_y Data 2014
• SiO_xN_y1000A Thickness uniformity 2014

Cleaning Recipes (PECVD #1)

To Be Added...

PECVD 2 (Advanced Vacuum)

Historical Particulate Data

• Particulates (Gain4) in PECVD#2 2015
• Particulates (Gain4) in PECVD#2 2016
• Particulates (Gain4) in PECVD#2 2017

• Particulates in PECVD#2 films 2017
• Particulates in PECVD#2 films 2018
• Particulates in PECVD#2 films 2019
• Particulates in PECVD#2 films 2020

SiO₂ deposition (PECVD #2)

Standard Recipe

• Oxide Standard Recipe 2014-5/9/18
• STD SiO2 5/9/18
• Table STD Oxide

Historical Data

Thin-Film Properties

• Oxide Data 2014
• Oxide Data 2015
• Oxide data 2016
• Oxide Data 2017
• Oxide Data 2018
• Oxide Data 2019
• Oxide Data 2020

Uniformity Data

• Oxide Thickness Uniformity 2014
• Oxide Thickness Uniformity 2015
• Oxide Thickness Uniformity 2016
• Oxide Thickness Uniformity 2017
• Oxide Thickness Uniformity 2018
• Oxide Thickness Uniformity 2019
• Oxide Thickness Uniformity 2020

SiN deposition (PECVD #2)

Standard Recipe

• SiNx Film Stress vs LF and HF Duration Time, and Gas Flowing-rate
• Nitride2 Standard Recipe 2014-5/9/2018
• STD Nitride2 Standard Recipe 5/9/2018
• Table STD Nitride2

Historical Data

Thin-Film Properties

• Nitride2 Data 2014
• Nitride2 Data 2015
• Nitride2 Data 2016
• Nitride2 Data 2017
• Nitride2 Data 2018
• Nitride2 Data 2019
• Nitride2 Data 2020

Uniformity Data

• Nitride2 Thickness Uniformity 2014
• Nitride2 Thickness Uniformity 2015
• Nitride2 Thickness Uniformity 2016
• Nitride2 Thickness Uniformity 2017
• Nitride2 Thickness Uniformity 2018
• Nitride2 Thickness Uniformity 2019
• Nitride2 Thickness Uniformity 2020

Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)

Standard Recipe

• STD LSNitride2 12/14/2018
• Table STD LS Nitride2
• Old Versions:
  • LS Nitride2 Standard Recipe 2014-5/9/2018
  • STD LSNitride2 5/9/2018

Historical Data

Thin-Film Properties

• LS Nitride2 Data 2014
• LS Nitride2 Data 2015
• LS Nitride2 Data 2016
• LS Nitride2 Data 2017
• LS Nitride2 Data 2018
• LS Nitride2 Data 2019
• LS Nitride2 Data 2020

Uniformity Data

• LS Nitride2 Thickness Uniformity 2014
• LS Nitride2 Thickness Uniformity 2015
• LS Nitride2 Thickness Uniformity 2016
• LS Nitride2 Thickness Uniformity 2017
• LS Nitride2 Thickness Uniformity 2018
• LS Nitride2 Thickness Uniformity 2019
• LS Nitride2 Thickness Uniformity 2020

Amorphous-Si deposition (PECVD #2)

• Amorphous Si Deposition Recipe
• Amorphous Si Films and Their Stress

Cleaning Recipes (PECVD #2)

To Be Added...

ICP-PECVD (Unaxis VLR)

Historical Particulate Data

• Particulates in Unaxis films @100C-2019
• Particulates in Unaxis films @250C-2019
• Particulates in Unaxis films @250C-2020

SiN deposition (Unaxis VLR)

The recipe SiN 100C is not valid currently, and is still under development. 
-- Demis 2019-11-22

• SiN 100C 300nm Data-2019
• SiN 100C Table-2019
• Thickness Uniformity SiN 100C 300nm-2019

SiN 250C Data 2020

• SiN 250C 300nm Data-2020
• SiN 250C Table-2020
• Thickness Uniformity SiN 250C 300nm-2020

SiN LS 250C Data 2020

• SiN LS 250C 300nm Data-2020
• SiN LS 250C Table-2020
• Thickness Uniformity SiN LS 250C 300nm-2020

SiO2 deposition (Unaxis VLR)

SiO2 100C Data 2019

• SiO2 LDR 100C Table-2019
• SiO2 HDR 100C Table-2019
• SiO2 LDR 100C 300nm Data-2019
• SiO2 HDR 100C 300nm Data-2019
• Thickness Uniformity SiO2 LDR 100C 300nm-2019
• Thickness Uniformity SiO2 HDR 100C 300nm-2019

SiO2 250C Data 2019

• SiO2 LDR 250C Table-2019
• SiO2 HDR 250C Table-2019
• SiO2 LDR 250C 300nm Data-2019
• SiO2 HDR 250C 300nm Data-2019
• Thickness Uniformity SiO2 LDR 250C 300nm-2019
• Thickness Uniformity SiO2 HDR 250C 300nm-2019

SiO2 250C Data 2020

• SiO2 LDR 250C Table-2020
• SiO2 HDR 250C Table-2020
• SiO2 LDR 250C 300nm Data-2020
• SiO2 HDR 250C 300nm Data-2020
• Thickness Uniformity SiO2 LDR 250C 300nm-2020
• Thickness Uniformity SiO2 HDR 250C 300nm-2020

Cleaning Recipes (Unaxis VLR Dep)

You must edit the Post-Dep Clean recipe to correspond to your deposited thickness and material. See the Operating Procedure on the Unaxis Tool Page for details.

• SiNx etches at 20nm/min
• SiO2 etches at 40nm/min