Lithography Recipes
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Lift-Off Techniques
Description/Tutorial
Bi-Layer Process with PMGI Underlayer and Contact Aligner
Lithography Recipes
Contact Aligners
Steppers
Flood Expose
E-Beam Lithography
Positive Resists
SUSS MJB-3
SUSS MA-6
Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ4110
AZ4210
AZ4330RS
OCG 825-35CS
SPR 950-0.8
SPR 955 CM-0.9
SPR 955 CM-1.8
SPR 220-3.0
SPR 220-7.0
THMR-IP3600 HP D
UV6-0.7
Negative Resists
SUSS MJB-3
SUSS MA-6
Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
AZ5214-EIR
AZnLOF 2020
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510
UVN30-0.5
SU-8 2015
Underlayers
SUSS MJB-3
SUSS MA-6
Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
PMGI SF-11
PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers
SUSS MJB-3
SUSS MA-6
Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
CEM-365 IS
E-Beam Resists
SUSS MJB-3
SUSS MA-6
Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
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Nanoimprint Resists
SUSS MJB-3
SUSS MA-6
Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
MR-I 7020
Nanonex NX-1020
SUSS MJB-3
SUSS MA-6
Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)
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