Difference between revisions of "ICP Etching Recipes"
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{{recipes|Dry Etching}} |
{{recipes|Dry Etching}} |
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=[[ICP Etch 1 (Panasonic E626I)]]= |
=[[ICP Etch 1 (Panasonic E626I)]]= |
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| − | ==SiO<sub>2</sub> Vertical Etch== |
+ | ==SiO<sub>2</sub> Vertical Etch (Panasonic 1)== |
*[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] |
*[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] |
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=[[ICP Etch 2 (Panasonic E640)]]= |
=[[ICP Etch 2 (Panasonic E640)]]= |
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| − | ==SiOx Vertical Etch== |
+ | ==SiOx Vertical Etch (Panasonic 2)== |
*[[media:Panasonic2-SiOx-Recipe.pdf|SiOx Vertical Etch Recipe]] |
*[[media:Panasonic2-SiOx-Recipe.pdf|SiOx Vertical Etch Recipe]] |
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Revision as of 12:16, 20 August 2012
Back to Dry Etching Recipes.