Difference between revisions of "Lithography Recipes"

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*[[ASML Recipes]]
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! width="1675" height="45" colspan="9" | <div style="font-size: 150%;">Lithography Recipes</div>
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*[[GCA Stepper Recipes]]
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*[[Contact Lithography Recipes]]  
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| <!-- INTENTIONALLY LEFT BLANK --> <br>
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*[[Nanoimprint Recipes]]  
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! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[Contact Alignment Recipes|Contact Aligners]]'''
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*[[Optical Bi-Layer Recipes]]  
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! bgcolor="#D0E7FF" align="center" colspan="3" | '''[[Stepper Recipes|Steppers]]'''
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*[[E-Beam Lithography Recipes]]  
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! width="90" bgcolor="#D0E7FF" align="center" | '''[[Flood Exposure Recipes|Flood Expose]]'''
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*[[Lab Techniques]]
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! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[E-Beam Lithography Recipes|E-Beam Lithography]]'''
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*[[Resist Stripping]]
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*[[Lithography Chemicals]]
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! width="20" bgcolor="#D0E7FF" align="center" | '''Positive Resists'''
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{{LithRecipe Table}}
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Revision as of 07:47, 21 August 2012

Lithography Recipes

 Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)
AZ4110
AZ4210







AZ4330RS
OCG 825-35CS







SPR 950-0.8
SPR 955 CM-0.9







SPR 955 CM-1.8
SPR 220-3.0







SPR 220-7.0
THMR-IP3600 HP D







UV6-0.7
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)
AZ5214-EIR







AZnLOF 2020
AZnLOF 2035







AZnLOF 2070
AZnLOF P5510
UVN30-0.5
SU-8 2015
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300) 		Stepper 2
(AutoStep 200) 		Stepper 3
(ASML DUV) 		MLA150
(Heidelberg)
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Lithography_Recipes&oldid=2066"