Difference between revisions of "Wet Etching Recipes"
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=Compound Semiconductor Etching= |
=Compound Semiconductor Etching= |
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+ | {| class="wikitable sortable" |
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+ | ! Material !! Etchant !! Rate (nm/min) !! Anisotropy !! Selective to !! Selectivity !! Ref. !! Notes !! Confirmed by !! Header text |
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+ | | InP|| Example || Example || Example || Example || Example || Example || Example || Example || Example |
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+ | |- |
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+ | | GaAs|| Example || Example || Example || Example || Example || Example || Example || Example || Example |
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+ | |- |
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+ | | GaN|| Example || Example || Example || Example || Example || Example || Example || Example || Example |
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+ | |} |
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=Metal Etching= |
=Metal Etching= |
Revision as of 11:06, 6 November 2013
Compound Semiconductor Etching
Material | Etchant | Rate (nm/min) | Anisotropy | Selective to | Selectivity | Ref. | Notes | Confirmed by | Header text |
---|---|---|---|---|---|---|---|---|---|
InP | Example | Example | Example | Example | Example | Example | Example | Example | Example |
GaAs | Example | Example | Example | Example | Example | Example | Example | Example | Example |
GaN | Example | Example | Example | Example | Example | Example | Example | Example | Example |