File:SEM Image of wafer after PR strip.png

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PR used as mask for 5min Si etch. Followed by PR strip with 2min over etch

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	18:36, 28 January 2025		1,500 × 601 (718 KB)	Gopimeena (talk \| contribs)

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Horizontal resolution	59.05 dpc
Vertical resolution	59.05 dpc