Dry Etching Recipes: Difference between revisions

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! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''RIE Etching'''
! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[RIE Etching Recipes|RIE Etching]]'''
! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''ICP Etching'''
! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[ICP Etching Recipes|ICP Etching]]'''
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! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''

Revision as of 17:32, 18 July 2012

Dry Etching Recipes
RIE Etching ICP Etching
Material RIE 1 RIE 2 RIE 3 RIE 5 Si Deep RIE ICP Etch 1 ICP Etch 2 UNAXIS VLR
Al
Ti
Cr
Ge
Ag
Ru
Mo
Ta
W
Al2O3
HfO2
ITo
SiO2
SiN
SiOxNy
Ta2O5
TiO2
TiN
ZnO2
ZrO2
GaAs
AlGaAs
InGaAlAs
InGaAsP
InP
GaN
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdTe
ZnSe
Si
SiC
Sapphire

Recipes

RIE Etching

ICP Etching