Dry Etching Recipes: Difference between revisions

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! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[ICP Etching Recipes|ICP Etching]]'''
! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[ICP Etching Recipes|ICP Etching]]'''
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!width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
!width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
|width="65" bgcolor="#DAF1FF" | [[RIE 1 (Custom)|RIE 1<br>(Custom)]]
|width="65" bgcolor="#DAF1FF" | [[RIE 1 (Custom)|RIE 1<br>(Custom)]]
|width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
|width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
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|width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
|width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
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= Recipes =

== RIE Etching ==

== ICP Etching ==

Revision as of 20:45, 18 July 2012

Dry Etching Recipes
RIE Etching ICP Etching
Material RIE 1
(Custom) 		RIE 2
(MRC) 		RIE 3
(MRC) 		RIE 5
(PlasmaTherm) 		Si Deep RIE
(PlasmaTherm/Bosch Etch) 		ICP Etch 1
(Panasonic E626I) 		ICP Etch 2
(Panasonic E640) 		ICP-Etch
(Unaxis VLR)
Al
Ti
Cr
Ge
Ag
Ru
Mo
Ta
W
Al2O3
HfO2
ITo
SiO2
SiN
SiOxNy
Ta2O5
TiO2
TiN
ZnO2
ZrO2
GaAs
AlGaAs
InGaAlAs
InGaAsP
InP
GaN
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdTe
ZnSe
Si
SiC
Sapphire
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Dry_Etching_Recipes&oldid=1206"