Dry Etching Recipes: Difference between revisions

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|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
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|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
|{{rl|ICP Etching Recipes|GaAs Etch (Unaxis VLR)}}
|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|GaAs Etch (Unaxis VLR)}}
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Revision as of 16:40, 29 July 2016

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Dry Etching Recipes
RIE Etching ICP Etching Oxygen Plasma Systems Other Dry Etchers
Material RIE 1
(Retired) 		RIE 2
(MRC) 		RIE 3
(MRC) 		RIE 5
(PlasmaTherm) 		Si Deep RIE
(PTI/Bosch) 		ICP Etch 1
(Panasonic 1) 		ICP Etch 2
(Panasonic 2) 		ICP-Etch
(Unaxis VLR) 		Ashers
(Technics PEII) 		Plasma Clean
(Gasonics 2000) 		UV Ozone Reactor Plasma Activation
(EVG 810) 		XeF2 Etch
(Xetch) 		Vapor HF Etch
(uETCH) 		CAIBE
(Oxford)
Al A R1 R1
Ti R1 A
Cr A R1 A
Ge
Ag
Pt R1
Au R1
Ni R1
Cu
Ru
Mo
Ta
W-TiW R1 A
Al2O3
HfO2
ITO R1
SiO2 R1 R1 R1
SiN R1 R1
SiOxNy
Ta2O5
TiO2
TiN
ZnO2
ZrO2
GaAs R1 R1 R1 GaAs-AlGaAs Etch (Unaxis VLR)
AlGaAs R1 R1 R1
InGaAlAs R1 R1
InGaAsP R1
InP R1 InP-InGaAs-InAlAs Etch (Unaxis VLR)
GaN R1 R1 R1
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdZnTe R1
ZnSe
Si R1 R1
SiC R1 A
Sapphire R1 A
Material RIE 1
(Retired) 		RIE 2
(MRC) 		RIE 3
(MRC) 		RIE 5
(PlasmaTherm) 		Si Deep RIE
(PlasmaTherm/Bosch Etch) 		ICP Etch 1
(Panasonic E626I) 		ICP Etch 2
(Panasonic E640) 		ICP-Etch
(Unaxis VLR) 		Ashers
(Technics PEII) 		Plasma Clean
(Gasonics 2000) 		UV Ozone Reactor Plasma Activation
(EVG 810) 		XeF2 Etch
(Xetch) 		Vapor HF Etch
(uETCH) 		CAIBE
(Oxford)
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