Template:Recipe: Difference between revisions
Jump to navigation
Jump to search
(1st attempt, using definition list) |
mNo edit summary |
||
| (5 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
<!-- Please replace the recipe name and other info with your own. |
|||
Use the Definition List syntax, where ; denotes a title and : denotes a new line for the list under that item. |
|||
--> |
|||
<noinclude>''The recipe shown here is just a placeholder - please replace this info with your own. This text won't show up in the final page.''</noinclude> |
|||
<includeonly>[[category:Recipes]]</includeonly> |
<includeonly>[[category:Recipes]]</includeonly> |
||
==Recipe== |
|||
;Recipe Name |
;Recipe Name |
||
: SiOVert_MadeUp |
: SiOVert_MadeUp |
||
;Tool |
|||
: Panasonic ICP #2 |
|||
;Description |
;Description |
||
| Line 20: | Line 28: | ||
: This recipe usually doesn't work. |
: This recipe usually doesn't work. |
||
: Film will etch in HF |
: Film will etch in HF |
||
----- |
|||
==Characterization== |
|||
[[File:Al-thickness-variation-with-rate.jpg]] |
|||
Latest revision as of 21:56, 3 August 2017
The recipe shown here is just a placeholder - please replace this info with your own. This text won't show up in the final page.
Recipe
- Recipe Name
- SiOVert_MadeUp
- Tool
- Panasonic ICP #2
- Description
- This recipe is made up, and deposits glass with lots of holes in it.
- Recipe Parameters
- Ar = 20 sccm
- O2 = 10 sccm
- Pressure = 50 mT
- RF = 200 W
- Temperature = 200°C
- Dep Rate
- 200 nm/min or 12,000 nm/sec
- Notes
- Make sure sample is inside out before loading into tool.
- This recipe usually doesn't work.
- Film will etch in HF
Characterization
