User contributions for John d

For John d talk block log uploads logs

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06:0206:02, 21 February 2025 diff hist +48‎ Process Group Interns ‎ →‎Current Interns: updated responsibilities current Tag: Visual edit

00:0800:08, 20 February 2025 diff hist −525‎ Template:Announcements ‎ deleted old announcements

00:1300:13, 15 February 2025 diff hist +444‎ Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit: update o "rule-based OPC" and other minor updates current Tag: Visual edit

21:3121:31, 14 February 2025 diff hist +18‎ m Stepper 3 (ASML DUV) ‎ Renamed job creator to mention Python script in TOC Tag: Visual edit
08:0908:09, 14 February 2025 diff hist +128‎ m Stepper Mask-Making Guidelines (Generic) ‎ →‎Generic Stepper Mask Parameters current Tag: Visual edit
08:0708:07, 14 February 2025 diff hist +384‎ Stepper Mask-Making Guidelines (Generic) ‎ →‎Generic Stepper Mask Parameters: added polarity Tag: Visual edit
08:0108:01, 14 February 2025 diff hist +132‎ m Stepper Mask-Making Guidelines (Generic) ‎ →‎Generic Stepper Mask Parameters Tag: Visual edit
07:5507:55, 14 February 2025 diff hist +66‎ Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit: moved Gopi's doc to top and highlighted and listed author Tag: Visual edit

22:3922:39, 13 February 2025 diff hist +36‎ m MLA150 - Design Guidelines ‎ →‎General CAD Guidelines current Tag: Visual edit
19:1619:16, 13 February 2025 diff hist +6‎ m Services ‎ →‎Important Info on Fabrication Services current Tag: Visual edit

22:2322:23, 10 February 2025 diff hist −230‎ Template:Announcements ‎ deleted lab closure, lab open

18:0618:06, 8 February 2025 diff hist +16‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
18:0518:05, 8 February 2025 diff hist −8‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
18:0418:04, 8 February 2025 diff hist −3‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
17:2217:22, 8 February 2025 diff hist +216‎ Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit: centered images Tag: Visual edit: Switched
01:1401:14, 8 February 2025 diff hist +41‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit
01:1201:12, 8 February 2025 diff hist +82‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction (OPC): Going below resolution limit Tag: Visual edit

23:5023:50, 7 February 2025 diff hist +56‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction: Going below resolution limit: link to skyler's google scholar Tag: Visual edit
23:4523:45, 7 February 2025 diff hist +36‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction: Going below resolution limit
23:4323:43, 7 February 2025 diff hist +784‎ Stepper 3 (ASML DUV) ‎ →‎UCSB Photomasks Available: added Skyler's OPC images. Tag: Visual edit
23:3623:36, 7 February 2025 diff hist +98‎ N File:ASML OPC - Skyler Palatnik 060224 PR vtxHvP 23mJ NO OPC 1.png ‎No edit summary current
23:3423:34, 7 February 2025 diff hist +74‎ N File:ASML OPC - Skyler Palatnik 060224 PR vtxHvP 15mJOPC 3.png ‎No edit summary current
21:1421:14, 7 February 2025 diff hist +48‎ m Template:Announcements ‎No edit summary
21:1321:13, 7 February 2025 diff hist +336‎ Template:Announcements ‎ Lab Closure: Mon Feb 10th, 8a-12n
00:5400:54, 7 February 2025 diff hist +34‎ m Process Group - Process Control Data ‎ →‎Deposition (Process Control Data) current Tag: Visual edit
00:5100:51, 7 February 2025 diff hist +475‎ Process Group - Process Control Data ‎ →‎Deposition (Process Control Data): added screenshots of SPC charts and data Tag: Visual edit: Switched
00:5000:50, 7 February 2025 diff hist +61‎ N File:PECVD1 SiO2 F50 WaferMap example.jpg ‎No edit summary current
00:4600:46, 7 February 2025 diff hist +31‎ N File:PECVD SPC Chart Example.png ‎No edit summary current
00:3000:30, 7 February 2025 diff hist +170‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction: Going below resolution limit Tag: Visual edit
00:2700:27, 7 February 2025 diff hist +63‎ m Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction: Going below resolution limit Tag: Visual edit

23:4123:41, 6 February 2025 diff hist +556‎ Stepper 3 (ASML DUV) ‎ →‎Optical Proximity Correction: Going below resolution limit: added table of images Tag: Visual edit
23:3923:39, 6 February 2025 diff hist +21‎ N File:ASML SEM DBR With OPC .png ‎No edit summary current
23:3823:38, 6 February 2025 diff hist +24‎ N File:ASML SEM DBR without OPC.png ‎No edit summary current
23:3723:37, 6 February 2025 diff hist +31‎ N File:ASML OPC CAD.png ‎No edit summary current
22:0922:09, 6 February 2025 diff hist +153‎ Services ‎ →‎Fabrication Services by NanoFab Staff: added academic rates policy for technical contact Tag: Visual edit

23:5423:54, 5 February 2025 diff hist +42‎ m Holographic Lith/PL Setup (Custom) ‎No edit summary current Tag: Visual edit
23:5323:53, 5 February 2025 diff hist −20‎ m Holographic Lith/PL Setup (Custom) ‎No edit summary
23:5223:52, 5 February 2025 diff hist +37‎ Photoluminescence PL Setup (Custom) ‎ add briant thiebaeult as 2nd supervisor current
23:5123:51, 5 February 2025 diff hist +112‎ Holographic Lith/PL Setup (Custom) ‎ add brian thibeault as 2nd supervisor
20:4120:41, 5 February 2025 diff hist +327‎ Template:Announcements ‎ dsx down
02:0102:01, 5 February 2025 diff hist +4‎ Template:Announcements ‎ ICP2 maint complete

19:4919:49, 4 February 2025 diff hist −437‎ Template:Announcements ‎ deleted holography
19:4819:48, 4 February 2025 diff hist −1,683‎ Template:Announcements ‎ updated ALD, deleted KLA P7, deleted Jan "lab open", deleted YES
19:4419:44, 4 February 2025 diff hist +245‎ Template:Announcements ‎ asml Q-PM
18:3718:37, 4 February 2025 diff hist −125‎ Stocked Chemical List ‎ deleted MR-I 7020 nanoimprint resist - not stocking anymore current Tag: Visual edit
04:1504:15, 4 February 2025 diff hist +15‎ m ICP Etching Recipes ‎ →‎Photoresist & ARC (Fluorine ICP Etcher) Tag: Visual edit

23:4523:45, 30 January 2025 diff hist +113‎ Stepper 3 (ASML DUV) ‎ tutorial explanation Tag: Visual edit
23:4423:44, 30 January 2025 diff hist +113‎ Stepper 2 (AutoStep 200) ‎ tutorial explanation current Tag: Visual edit
23:4423:44, 30 January 2025 diff hist +433‎ Stepper 1 (GCA 6300) ‎ →‎CAD Files: added Mask Making section and Cell+Layer for the CAD tempalte current Tag: Visual edit
23:4023:40, 30 January 2025 diff hist +312‎ Autostep 200 Mask Making Guidance ‎ →‎CAD Files: added photomask Cell + Layer current Tag: Visual edit

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