Automated Coat/Develop System (S-Cubed Flexi): Difference between revisions
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|type = Wet Processing |
|type = Wet Processing |
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|recipe = Lithography |
|recipe = Lithography |
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|materials = |
|materials = |
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|toolid=67 |
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'''THIS TOOL IS ONLY FOR STAFF USE AT THIS TIME.''' |
'''THIS TOOL IS ONLY FOR STAFF USE AT THIS TIME.''' |
Revision as of 20:29, 13 November 2019
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THIS TOOL IS ONLY FOR STAFF USE AT THIS TIME.
About
To Be Added
Detailed Specifications
- Wafer Size: 100mm (150mm possible but not set up)
- PR Coating Properties:
- Uniformity < 1.0%
- < 100 particles on 100mm wafer
- Photoresists/Underlayers Available:
- UV6-0.8
- DS-K101-304
- PMMA
- PMGI SF11
- PMGI SF5
- Solvents Available:
- EBR100
- Developers Available:
- AZ 300 MiF
Process Information
- Recipe Page for S-Cubed Coater: Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi)
- See the Photolith. Chemicals page for info on the installed resists.
Operating Procedures
- To Be Added