Stocked Chemical List: Difference between revisions
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m (su-8 = PR) |
(added BHF % concentration) |
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|BUFFER-HF |
|BUFFER-HF |
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|TRANSENE COMPANY, INC. |
|TRANSENE COMPANY, INC. |
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|BHF, "Buffered oxide etch" |
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|BHF |
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4-8% HF |
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|Hydrobromic, 500 mL |
|Hydrobromic, 500 mL |
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Revision as of 15:59, 8 April 2020
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| CHEMICAL | DESCRIPTION | VENDOR | Other Names/Notes |
|---|---|---|---|
| Acetone, 4L, 4 bt = 1 cs | ACETONE ACS SAFE-COTE 4L Percent Purity ≥99.5% | FISHER SCIENTIFIC | ACE |
| Propanol, 4L, 4 bt = 1 cs | 2-PROPANOL OPTIM AGRADE Percent Purity ≥99.9% | FISHER SCIENTIFIC | ISO, Isopropanol |
| Ethanol | DEHYDRATED ALCOHOL, 200 PROOF, UNDENATURED, USP GRADE- 4LGLASS | SPECTRUM CHEMICALS & LAB | |
| Methanol, 4L, 4 bt = 1 cs | METHANOL OPTIMA GRADE 4L Percent Purity ≥99.9% | FISHER SCIENTIFIC | |
| Toluene, 4 L | TOLUENE OPTIMA GRADE 4L Percent Purity ≥99.8% | FISHER SCIENTIFIC | |
| Ethylene Glycol | ETHYLENE GLYCOL LABORATORY GRADE | FISHER SCIENTIFIC | |
| Amyl Acetate, 4L bottle | AMYL ACETATE LABORATORY GRADE 4L | FISHER SCIENTIFIC | |
| MIBK, 4L bottle | Methyl iso-Butyl Ketone (Certified ACS), Grade Certified ACS Reagent | FISHER SCIENTIFIC | |
| Chloroform, 2.5 L | Chloroform, 99+%, Acros Organics | FISHER SCIENTIFIC | |
| Xylenes, 1 liter | XYLENES ACS 4L Percent Purity ≥98.5% | FISHER SCIENTIFIC | |
| T1100 BCB rinse solvent | RINSE T1100 4 LITER GLASS BOTTLE | MICROCHEM CORP. | |
| Nitric, 500ml. | NITRIC ACID IND SAFECOTE 2,5L, Assay Percent Range 70% | FISHER SCIENTIFIC | |
| Sulfuric, 2.5 L | SULFURIC AC 21/2L IND SAFECOTE Assay Percent Range 95.0 to 98.0 w/w % | FISHER SCIENTIFIC | H2SO4 |
| O-Phosphoric, 2.5 L | O-PHOSPHORIC ACID Percent Purity ≥85.0% (w/w) | FISHER SCIENTIFIC | H3PO4 |
| Citric acid, liquid, 1.0 M, 1L | CITRIC ACID, 1.00 Molar | FISHER SCIENTIFIC | C6H8O7, solution |
| 50/50 w/w Citric Acid Monohydrate in Water | PREMIX CITRIC ACID CAW 1:1 | TRANSENE COMPANY, INC. | C6H8O7, solution |
| Citric acid, granular, monohydrate, 3 kg | CITRIC ACID GRAN CERT ACS 3KG Percent Purity 99.0 to 102.0% | FISHER SCIENTIFIC | C6H8O7, powder |
| Acetic, 2.5L | ACETIC ACID GLACIAL ACS 2.5L IND SAF-CT Assay Percent Range: ≥99.7% w/w | FISHER SCIENTIFIC | |
| Hydrochloric, 2.5L | HYDROCHLORIC ACID Percent Purity 36.5 to 38.0% (w/w) | FISHER SCIENTIFIC | HCl |
| Hydrofluoric, 49%, 500 Ml | HYDROFLUORIC ACID RGT 500ML Assay (HF) 48 - 51% | VWR INTERNATIONAL | HF |
| Hydrofluoric, Buffered HF, 1 gal | BUFFER-HF | TRANSENE COMPANY, INC. | BHF, "Buffered oxide etch"
4-8% HF |
| Hydrobromic, 500 mL | HYDROBROMIC ACID 48% CERT ACS 500ML Percent Purity 47.0 to 49.0% | FISHER SCIENTIFIC | HBr |
| Chrome mask etchant, 1 qt | CHROMIUM ETCHANT 1020 | TRANSENE COMPANY, INC. | |
| Aluminum etchant, A, 1 qt | ALUMINUM ETCHANT TYPE A | TRANSENE COMPANY, INC. | |
| Aluminum etchant, D, 1 qt | ALUMINUM ETCHANT TYPE D | TRANSENE COMPANY, INC. | |
| Gold etchant, TFA, 1 qt | GOLD ETCHANT TFA | TRANSENE COMPANY, INC. | |
| Nickel etchant, TFB, 1 qt. | NICKEL ETCH TFB | TRANSENE COMPANY, INC. | |
| Titanium etchant, TFTN | TITANIUM ETCHANT TFTN | TRANSENE COMPANY, INC. | |
| Nanostrip | KMG-Nanostrip | INTEGRATED MICRO MATERIALS | |
| Oxalic Acid | OXALIC ACID CERTIF ACS 500G Percent Purity 99.5 to 102.5% | FISHER SCIENTIFIC | |
| Formic Acid | FORMIC ACID 2.5LT 98% (ACS) | FISHER SCIENTIFIC | |
| Chromic Acid (Chromium Trioxide) | Chromium Trioxide (Crystalline/Certified ACS) Percent Purity ≥98.0% | FISHER SCIENTIFIC | CrO3 |
| Ammonium hydroxide, 2.5 L | AMMONIUM HYDROXIDE ACS Assay Percent Range: 28.0 to 30.0 w/w % | FISHER SCIENTIFIC | NH4OH |
| Ammonium sulfide, 500 mL | AMMONIUM SULFIDE SOLUTION Assay Percent Range 20 to 24% (aqueous) | FISHER SCIENTIFIC | (NH4)2S |
| Sodium hydroxide, 1L | SODIUM HYDROX SOL 50% CERT 1L Percent Purity Inclusive between 50% | FISHER SCIENTIFIC | NaOH |
| Potassium hydroxide, 43. | POT HYDROX SOL 45% CERT 4L Concentration or Composition (by Analyte or Components) 45% | FISHER SCIENTIFIC | KOH |
| Hydrogen peroxide, 500 mL | HYDROGEN PEROXIDE 30% Percent Purity 30.0 to 32.0% | FISHER SCIENTIFIC | H2O2 |
| Hydrogen peroxide, 1 gal | HYDROGEN PEROXIDE 30% Percent Purity 30.0 to 32.0% | FISHER SCIENTIFIC | H2O2 |
| TMAH, 25%, per liter | TETRAMETHYLAMMONIUM HYDROXIDE, 25% | TRANSENE COMPANY, INC. | |
| Saturated Bromine Water (SBW), 1L | BROMINE WATER RGT 500ML Percent Purity ≥99.5% | FISHER SCIENTIFIC | |
| AZ400k developer, concentrated, 1 gal | AZ 400K CONCENTRATE PHOTORESIST DEVELOPER | INTEGRATED MICRO MATERIALS | |
| AZ400k developer, 1:4 diluted, 1 gal | AZ 400k 1:4 PHOTORESIST DEVELOPER | INTEGRATED MICRO MATERIALS | Pre-diluted |
| AZ 726 MIF developer, 1 gal | AZ 726 MIF DEVELOPER | INTEGRATED MICRO MATERIALS | |
| AZ NMP Rinse & Photoresist Stripper | AZ® NMP Rinse & Photoresist Stripper | INTEGRATED MICRO MATERIALS | |
| AZ 300 T, stripper, 1 gal. | AZ 300T STRIPPER | INTEGRATED MICRO MATERIALS | |
| MicroChem 101A Developer, 1 gal | 101A DEVELOPER | MICROCHEM CORP. | SAL 101A, XP 101A |
| AZ 300 MIF Developer | AZ 300 MIF DEVELOPER | INTEGRATED MICRO MATERIALS | |
| SU-8 Developer | SU-8 DEVELOPER - 4 X 4L | MICROCHEM CORP. | |
| DS2100 BCB Developer | DEVELOPER DS2100 | MICROCHEM CORP. | BCB Developer |
| EC 11 | EC SOLVENT 11 - 4 GL CS | MICROCHEM CORP. | |
| AZ EBR | AZ EBR EDGE BEAD REMOVER | INTEGRATED MICRO MATERIALS | |
| KwikStrip, gallon size | AZ KWIK STRIP PHOTORESIST STRIPPER | INTEGRATED MICRO MATERIALS | |
| Remover PG, SU-8 stripper | REMOVER PG - 4 X 4L | MICROCHEM CORP. | |
| SPR 955 CM-0.9, 1 Gal. | SPR 955CM-0.9 - 1 GL | MICROCHEM CORP. | Photoresist, PR |
| SPR 955 CM-1.8, 1 Gal. | SPR 955CM-1.8 - 1 GL | MICROCHEM CORP. | Photoresist, PR |
| SPR 220-3.0, 1 gal. | SPR 220-3.0 P.R. 1GL | MICROCHEM CORP. | Photoresist, PR |
| SPR 220-7.0, 1 GAL, | SPR 220-7.0 P.R. 1GL | MICROCHEM CORP. | Photoresist, PR |
| CEM-365 IS, for stepper, 1 pint. | CEM365IS-QT | SHIN-ETSU MICROSI, INC. | Photoresist, PR contrast enhancer |
| OCG 825-35CS | OCG 825 35CS 1X1 GALLON GLASS | GALLADE CHEMICAL | Photoresist, PR |
| AZ P4110 1Qt. | AZ P4110 PHOTORESIST | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZ P4210 1Qt. | AZ P4210 G-LINE/BROADBAND PHOTORESIST | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZ P4330 RS 1QT. | AZ P4330-RS | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZ 5214-EIR 1QT. | AZ 5214-E IR PHOTORESIST | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZ P4620 1QT | AZP4620-1Q | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZ P9260 1gal. | AZ® 9260 i-line / Broadband Photoresist | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZnLOF 2020, 1 gal. | AZ nLoF 2020 NEGATIVE TONE LIFT-OFF PHOTORESIST | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZnLOF 2035, 1 qt. | AZ Nlof 2035 NEGATIVE TONE LIFT-OFF PHOTORESIST | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| AZnLOF 2070, 1 qt | AZ NLOF2070 NEGATIVE TONE LIFT-OFF PHOTORESIST | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| NR9-1000PY | Negative Resist NR9-1000PY | Futurrex, Inc. | Photoresist, PR |
| NR9-3000PY | Negative Resist NR9-3000PY | Futurrex, Inc. | Photoresist, PR |
| NR9-6000PY | Negative Resist NR9-6000PY | Futurrex, Inc. | Photoresist, PR |
| LOL 2000, 1 qt. | LOL 2000 -1 QT | MICROCHEM CORP. | Photoresist, PR Underlayer |
| AZ nLOF P5510 photoresist, 1 gallon | AZ nLoF 5510 NEGATIVE TONE LIFT-OFF PHOTORESIST. | INTEGRATED MICRO MATERIALS | Photoresist, PR |
| THMR-IP3600 HP D | THMR-IP3600 HP | TOK AMERICA, INC. | Photoresist, PR |
| XHRIC-11 1 LITER | XHRIC-11 1 LITER | BREWER SCIENCE, INC. | Photoresist, PR, BARC |
| MR-I 7020, Imprint Resist 250ml | MRT - mr-I 7020E - 250ml GLASS | MICROCHEM CORP. | Nanoimprint Thermoplastic Resist, NIL |
| PMGI, SF 3, 500 ml | PMGI SF 3 - 500ml Glass | MICROCHEM CORP. | Photoresist, PR |
| PMGI, SF 5, 500 ml | PMGI SF 5 - 500ml Glass | MICROCHEM CORP. | Photoresist, PR |
| PMGI, SF 8, 500 ml | PMGI SF-8, glass 500ml | MICROCHEM CORP. | Photoresist, PR |
| PMGI, SF11, 500 ml | PMGI SF 11 - 500ML GLASS | MICROCHEM CORP. | Photoresist, PR |
| PMGI, SF15, 500 ml | PMGI SF 15 - 500ML GLASS | MICROCHEM CORP. | Photoresist, PR |
| Dow Advanced Electronic, 4024-40, photo BCB | CYCLOTENE* 4024 - 40 / 0.95 LITERS (BCB) | MICROCHEM CORP. | Photo-BCB |
| Cyclotene 3022-46 | CYCLOTENE* 3022-46 | MICROCHEM CORP. | BCB |
| AP3000 BCB Adhesion Promoter, gall. | ADHESION PROMOTER AP3000 | MICROCHEM CORP. | BCB Adhesion Promoter |
| Omnicoat, adhesion promoter for SU-8 | OMNICOAT - 500ML GLASS | MICROCHEM CORP. | Resist |
| HMDS, (Fineline adhes.), 1 bt. | MPHP-PT MICROPRIMER HIGH PURITY | SHIN-ETSU MICROSI, INC. | Photoresist Adhesion Promoter |
| Tergitol | Spectrum Chemical Manufacturing Corporation TERGITOL NP-10 SURFCTNT 500ML T1273500ML | FISHER SCIENTIFIC | Detergent |
| SU-8 2005 Photoresist | SU-8 2005 - 500ml GLASS | MICROCHEM CORP. | Photoresist, PR |
| SU-8 2010 Photoresist | SU-8 2010 - 500ml GLASS | MICROCHEM CORP. | Photoresist, PR |
| SU-8 2015 Photoresist | SU-8 2015 - 500ml GLASS | MICROCHEM CORP. | Photoresist, PR |
| SU-8 2075 Photoresist | SU-8 2075 - 500ml Glass Resist | MICROCHEM CORP. | Photoresist, PR |
| UV-6 0.8 Photoresist | UV6-0.8 | MICROCHEM CORP. | Photoresist, PR |
| DUV42P-6 | DUV42P-6 | BREWER SCIENCE, INC | Photoresist, PR, BARC |
| Honeywell 512B spin-on-glass, 125 ml. | ACCUGLASS 512B SPIN-ON GLASS | HONEYWELL ANALYTICS INC. | SOG |
| UVN 30-0.8L (UVN 2300-0.5) | UVN 30-0.8L-1 GL NOWPAK | MICROCHEM CORP. | Photoresist, PR |
| Brewer Science DS-K101-304, 1 gal bt. | ARC DS-K101-304, 1 LITER | BREWER SCIENCE, INC. | Photoresist, PR, BARC |
| UV 210GS-0.3, 1 gal. bt. | UV 210GS-0.3 - 1 GL NOWPAK | MICROCHEM CORP. | Photoresist, PR |
| mr-UV Cur 21 100 nm, 100ml. | MRT-mr-UV Cur 21, 100nm - 100ml Glass | MICROCHEM CORP. | Nanoimprint Resist |
| Santovac 5P | Santovac 5P Ultra Polyphenyl Ether Pump Fluid | KURT J LESKER | Oil |
| SF1 Polishing Fluid | SF1 Polishing Fluid | LOGITECH LIMITED | CMP Slurry |