Template:LithRecipe Table: Difference between revisions
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<includeonly>| width="100" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Suss Aligners (SUSS MJB-3)|SUSS MJB-3]] |
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| width="100" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Contact Aligner (SUSS MA-6)|SUSS MA-6]] |
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| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 1 (GCA 6300)|Stepper 1<br>(GCA 6300)]] |
| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 1 (GCA 6300)|Stepper 1<br>(GCA 6300)]] |
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| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 2 (AutoStep 200)|Stepper 2<br>(AutoStep 200)]] |
| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 2 (AutoStep 200)|Stepper 2<br>(AutoStep 200)]] |
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| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 3 (ASML DUV)|Stepper 3<br>(ASML DUV)]] |
| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 3 (ASML DUV)|Stepper 3<br>(ASML DUV)]] |
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| width="100" bgcolor="#DAF1FF" | [[Maskless Aligner Recipes|MLA150<br>(Heidelberg)]]</includeonly> |
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| width="175" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#Field Emission SEM 1 (FEI Sirion)|Field Emission SEM 1<br>(FEI Sirion)]] |
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| width="175" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#E-Beam Lithography System (JEOL JBX-6300FS)|E-Beam Lithography System<br>(JEOL JBX-6300FS)]] |
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{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1" |
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|- {{LithRecipe Table}} |
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[[category:Templates]] |
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Used on the '''[https://wiki.nanotech.ucsb.edu/wiki/Lithography_Recipes#Photolithography_Recipes Lithography Recipes page]''' to repeat the Table header multiple times. |
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Latest revision as of 06:25, 14 September 2020
| SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
Used on the Lithography Recipes page to repeat the Table header multiple times.