Process Group - Process Control Data: Difference between revisions
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(→ICP-PECVD (Unaxis VLR Dep): link to SiO2/SiN plots separately) |
(→Etching (Process Control Data): link to FL-ICP google sheets (noahD)) |
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===[[ICP Etching Recipes#Process Control Data .28Fluorine ICP Etcher.29|PlasmaTherm SLR Fluorine Etcher]]=== |
===[[ICP Etching Recipes#Process Control Data .28Fluorine ICP Etcher.29|PlasmaTherm SLR Fluorine Etcher]]=== |
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*[ |
*[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit?usp=sharing SiO<sub>2</sub> Etching with CHF3/CF4 - '''Etch Data'''] |
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*[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit?usp=sharing SiO<sub>2</sub> Etching with CHF3/CF4 - '''Plots'''] |
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**[[Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher|OLD - SiO<sub>2</sub> Etching with CHF3/CF4 (FL-ICP)]] |
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***[[Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher|''No data prior to 2023-01-20'']] |
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===[[ICP Etching Recipes#Process Control Data .28Panasonic 1.29|Panasonic ICP #1]]=== |
===[[ICP Etching Recipes#Process Control Data .28Panasonic 1.29|Panasonic ICP #1]]=== |
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Revision as of 18:46, 20 January 2023
These are the same links found on individual tool pages, in the Recipes > <<tool page>> > Process Control section.
Deposition (Process Control Data)
PECVD #1 (PlasmaTherm 790)
PECVD #2 (Advanced Vacuum)
ICP-PECVD (Unaxis VLR Dep)
- ICP-PECVD: Plots of SiO2 Films
- ICP-PECVD: Plots of Si3N4 Films
- ICP-PECVD: SiO2 Low-Dep Rate (LDR)
- ICP-PECVD: SiO2 High-Dep Rate (HDR)
- ICP-PECVD: Si3N4
- ICP-PECVD: Si3N4 Low-Stress
Ion Beam Sputter Deposition (Veeco Nexus)
Old Data (Pre 2022)
Old data in a different format can be found below: