E-Beam 5 (Plasys): Difference between revisions
Jump to navigation
Jump to search
(inital page and descriptions) |
|||
Line 26: | Line 26: | ||
=Documentation= |
=Documentation= |
||
*[ |
*[https://wiki.nanotech.ucsb.edu/w/images/8/82/EBeam5_Operating_Procedures.pdf EBeam5_-_Operating_Instructions] |
||
=Recipes= |
=Recipes= |
Latest revision as of 17:13, 21 March 2023
|
About
The Plasys is a single-wafer load evaporator with programmable wafer angle, wafer rotation, ion-mill pre-cleaning and oxygen flow capabilities, in situ while keeping the wafer under vaccuum.
Only Aluminum is currently installed.
The system is currently dedicated only to specific use-cases such as superconducting aluminum evap.
Materials and Recipes allowed are tightly controlled. Please contact the supervisor to find out if your application is allowed on this machine.
Detailed Specifications
- To Be Added
Documentation
Recipes
- To Be Added