DUV Flood Expose: Difference between revisions
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<br />{{tool2|{{PAGENAME}} |
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|picture=DUV.jpg |
|picture=DUV.jpg |
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|type = Lithography |
|type = Lithography |
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|super= |
|super= Lee Sawyer |
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|super2= Bill Millerski |
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|phone=(805)839-3918x219 |
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|phone=(805)893-2123 |
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|location=Bay 6 |
|location=Bay 6 |
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|email= |
|email=lee_sawyer@ucsb.edu |
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|description = Deep UV Flood |
|description = 1000W Deep UV Flood Exposure System (LS-150X-10C2) and Illumination Controller (2130-C2) |
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|manufacturer = AB Manufacturing |
|manufacturer = Bachur & Associates/AB Manufacturing |
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|materials = |
|materials = |
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}} |
}} |
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==About== |
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This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter. |
This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter. |
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Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc. |
Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc. |
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=Detailed Specifications= |
==Detailed Specifications== |
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*DUV wavelengths are 200-260 nm; the lamp power is limited to |
*DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 watts and can operate in either constant intensity or constant power mode |
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*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample |
*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample |
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*Exposure can be performed on a 4" wafer |
*Exposure can be performed on a 4" wafer |
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*Lamps are nominally rated for 400 hours |
*Lamps are nominally rated for 400 hours |
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*A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation |
*A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation |
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=Spectra Images= |
==Spectra Images== |
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==Aligner with No Filter== |
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[[image:DUV-Spectra-No-Filter.png|thumb|none|600px|Aligner with No Filter]] |
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==Aligner with Filter for i-line Exposure== |
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[[image:DUV-Spectra-With-Filter.png|thumb|none|600px|Aligner with Filter for i-line Exposure]] |
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[[image:DUV-System-Spectra.png|thumb|none|600px|DUV Exposure System Spectra]] |
[[image:DUV-System-Spectra.png|thumb|none|600px|DUV Exposure System Spectra]] |
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==Documentation== |
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*[https://wiki.nanofab.ucsb.edu/w/images/8/89/DUV_Flood_Expose_SOP_Rev_C.pdf DUV Flood Expose Standard Operating Procedure] |
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Latest revision as of 22:40, 4 January 2024
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About
This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter.
Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc.
Detailed Specifications
- DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 watts and can operate in either constant intensity or constant power mode
- The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample
- Exposure can be performed on a 4" wafer
- Lamps are nominally rated for 400 hours
- A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation
