Process Group Internships: Difference between revisions
Jump to navigation
Jump to search
(internship goals, skillss learns and detailed 2-phase approach) |
m (header level fix) |
||
(2 intermediate revisions by the same user not shown) | |||
Line 1: | Line 1: | ||
The NanoFab hosts UCSB Undergraduate Interns throughout the school year and summer. |
The NanoFab hosts UCSB Undergraduate Interns throughout the school year and summer. |
||
=== Internship Goals === |
|||
Our goals are twofold: |
Our goals are twofold: |
||
# Acquire [[Process Group - Process Control Data|Process Control Data]] |
# '''Increased Tool Uptime''': Acquire [[Process Group - Process Control Data|Process Control Data]] so NanoFab staff can proactively identify equipment/process problems, and |
||
# Give [[Process Group Interns|Interns]] |
# '''Industry-Relevant Experience''': Give [[Process Group Interns|Interns]] hands-on industry-relevant experience to minimize the training required at any microelectronics company/research group. |
||
The skills acquired for each goal are as follows: |
The skills acquired for each goal are as follows: |
||
=== Industry-relevant Experience === |
==== Industry-relevant Experience ==== |
||
⚫ | |||
⚫ | |||
** Cleanroom safety & protocols such as PPE, safe waste disposal etc. |
** Cleanroom safety & protocols such as PPE, safe waste disposal etc. |
||
** Managing their own schedule to accomplish weekly processing tasks. |
** Managing their own schedule to accomplish weekly processing tasks. |
||
Line 23: | Line 23: | ||
** Eg. 4 different plasma depositions, 4 different ICP etchers etc. |
** Eg. 4 different plasma depositions, 4 different ICP etchers etc. |
||
** Once an intern has learned 3 different PECVD deposition tools, it is trivial to learn a new PECVD tool even from an unfamiliar manufacturer. |
** Once an intern has learned 3 different PECVD deposition tools, it is trivial to learn a new PECVD tool even from an unfamiliar manufacturer. |
||
* [https://en.wikipedia.org/wiki/Manufacturing_execution_system '''MES''']: Learn to utilize production tracking/communications |
* [https://en.wikipedia.org/wiki/Manufacturing_execution_system '''MES''']: Learn to utilize production tracking/communications tools |
||
** Travelers/Process Followers |
** Travelers/Process Followers & associated data directories are created and filled out at run-time for every calibration. (Digital/online via Google Sheets+Drive) |
||
** |
** Combining ''Equipment Operating Procedures'' with ''Process Travelers'' instructions at run-time. |
||
** Data collection with standardized digital filenames |
** Data collection with standardized digital filenames & directory structures, available online to all lab users. |
||
* '''[https://en.wikipedia.org/wiki/Statistical_process_control SPC]''': Perform metrology, process control, create SPC charts |
* '''[https://en.wikipedia.org/wiki/Statistical_process_control SPC]''': Perform metrology, process control, create SPC charts |
||
** Data from the Travelers are entered into online spreadsheets, which calculate SPC charts |
** Data from the Travelers are entered into online spreadsheets, which calculate SPC charts |
||
Line 33: | Line 33: | ||
** If Process Engineers identify an Out-of-Control process, Interns are involved in the communications & testing of tool repairs. |
** If Process Engineers identify an Out-of-Control process, Interns are involved in the communications & testing of tool repairs. |
||
=== Process Control for Increased Uptime === |
==== Process Control for Increased Uptime ==== |
||
* Interns run process-control on the lab's most critical/high-usage tools. |
* Interns run process-control on the lab's most critical/high-usage tools. |
||
* Calibration processes are identical each time (unlike lab user's processes), allowing apples-to-apples comparisons. |
* Calibration processes are identical each time (unlike lab user's processes), allowing apples-to-apples comparisons. |
Latest revision as of 16:46, 9 December 2024
The NanoFab hosts UCSB Undergraduate Interns throughout the school year and summer.
Internship Goals
Our goals are twofold:
- Increased Tool Uptime: Acquire Process Control Data so NanoFab staff can proactively identify equipment/process problems, and
- Industry-Relevant Experience: Give Interns hands-on industry-relevant experience to minimize the training required at any microelectronics company/research group.
The skills acquired for each goal are as follows:
Industry-relevant Experience
- Protocols: Interns become comfortable in a busy semiconductor 'fab environment. After 2-3 months of regular usage the interns are fully comfortable with:
- Cleanroom safety & protocols such as PPE, safe waste disposal etc.
- Managing their own schedule to accomplish weekly processing tasks.
- Multi-tasking to run simultaneous processes fast and efficiently.
- Interns learn new tools only once their current cals have been condensed into a few hours.
- Communications with
- lab users (scheduling around other users)
- equipment staff (reporting tool issues)
- process supervisors/managers (reviewing process control data)
- Equipment: Become comfortable with learning different SOP's of similar tool types
- Eg. 4 different plasma depositions, 4 different ICP etchers etc.
- Once an intern has learned 3 different PECVD deposition tools, it is trivial to learn a new PECVD tool even from an unfamiliar manufacturer.
- MES: Learn to utilize production tracking/communications tools
- Travelers/Process Followers & associated data directories are created and filled out at run-time for every calibration. (Digital/online via Google Sheets+Drive)
- Combining Equipment Operating Procedures with Process Travelers instructions at run-time.
- Data collection with standardized digital filenames & directory structures, available online to all lab users.
- SPC: Perform metrology, process control, create SPC charts
- Data from the Travelers are entered into online spreadsheets, which calculate SPC charts
- Some interns create/modify SPC charts when needed for newly developed Cals.
- OCAP/Repair: Work with tool engineers to identify & diagnose equipment problems.
- If Process Engineers identify an Out-of-Control process, Interns are involved in the communications & testing of tool repairs.
Process Control for Increased Uptime
- Interns run process-control on the lab's most critical/high-usage tools.
- Calibration processes are identical each time (unlike lab user's processes), allowing apples-to-apples comparisons.
- Regular meetings with Process Engineers allow us to proactively identify equipment/process issues, failing tool components, and schedule repairs/remedies sooner than if detected by a lab user.
- Lab users are notified of process anomalies & repair plans, reducing bad outcomes for lab users.
- "Contamination" checks via On-Demand process-checks
- Determine whether a new process affects other processes on the same tool, by running pre/post Cal Etches.
- On ICP Etchers, enables data-driven equipment sharing between processes.
- Enables lab-users to quickly determine whether problems lie with the Equipment/"contamination", another user's process or their own Process.
Job Description: 2 phases
Internships are generally run in 2 phases, with each phase being approx. 1 Quarter (3 months) long.
Phase 1: Deposition Cals (1st Quarter)
- Interns learn 4 different deposition tools, in the following order:
- Plasmatherm PECVD 1
- Advanced Vacuum PECVD 2,
- Unaxis ICP-PECVD,
- Veeco Ion Beam Deposition
- 3-4 different films (SiO2, Si3N4, Low-stress-Si3N4) are run on each tool.
- Every film undergoes the following metrology:
- Ellipsometry: Thin-film thickness and refractive index at 2 different wavelengths.
- Reflectometry Wafer Mapping: Thin-film Uniformity across the wafer.
- Particle Count: laser-scanning via Surfscan, at two different particle-size/range settings
- Thin-Film Stress: requires before & after wafer bow measurements via laser scanning
- By the end of 1st Quarter, Interns are running 9-12 thin-film cals every 2 weeks.
Phase 2: EtchCals and LithoCals (2nd Quarter)
- Interns learn 4 different ICP Etchers:
- Plasmatherm SLR Fluorine Etcher
- Oxford Cobra III-V Etcher
- Plasmatherm DSEiii
- Panasonic ICP #2
- 1-2 different Etches per tool; one "insensitive" to chamber condition, one "sensitive" to chamber condition.
- Interns learn ASML DUV Stepper lithography: photoresist coating, exposure and develop.
- Critical particulate-sensitive process, cal shows any particles present
- Intern's techniques are remedied if particles are detected.
- Critical particulate-sensitive process, cal shows any particles present
- Metrology on each EtchCal:
- SEM of manually Cleaved Cross-section
- Profilometry & Etch-Rate Calculation
- Etch Selectivity Calculation via pre/post hardmask removal profilometry
- Metro on each LithoCal:
- SEM for Critical Dimension measurement; multiple locations on wafer.
- Identification of "hotspot" particulate contamination on wafer/tool.
- By the end of 2nd Quarter, Interns are running LithoCals and ~2 Etchcals weekly, with multiple SEM sessions. They are proficient at SEM by the end of the 2nd quarter.