ICP Etching Recipes: Difference between revisions
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===InP Etch (H<sub>2</sub> Ar)=== |
===InP Etch (H<sub>2</sub> Ar)=== |
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*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]] |
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]] |
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==Si Etch (XeF2 Etcher)== |
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*[[media:|Si Etch Recipe]] |
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Revision as of 18:33, 17 September 2013
Back to Dry Etching Recipes.
ICP Etch 1 (Panasonic E626I)
SiO2 Etching (Panasonic 1)
Cr Etch (Panasonic 1)
ICP Etch 2 (Panasonic E640)
SiO2 Etching (Panasonic 2)
ICP-Etch (Unaxis VLR)
InP Etch (Unaxis VLR)
InP Etch
InP Etch (H2 Ar)
Si Etch (XeF2 Etcher)
- [[media:|Si Etch Recipe]]