ICP Etching Recipes: Difference between revisions
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==SiO<sub>2</sub> Etching (Panasonic 2)== |
==SiO<sub>2</sub> Etching (Panasonic 2)== |
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*[[media:Panasonic2-SiOx-Recipe.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] |
*[[media:Panasonic2-SiOx-Recipe.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] |
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==Al Etch (Panasonic 2)== |
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*[[media:Panasonic-1-Al-Etch-RevA.pdf|Al Etch Recipes - use panasonic 1 parameters, etch rate 50% higher]] |
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=[[ICP-Etch (Unaxis VLR)]]= |
=[[ICP-Etch (Unaxis VLR)]]= |
Revision as of 21:03, 27 September 2013
Back to Dry Etching Recipes.