ICP Etching Recipes: Difference between revisions
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===InP Etch (H<sub>2</sub> Ar)=== |
===InP Etch (H<sub>2</sub> Ar)=== |
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*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]] |
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|Unaxis InP Etch Recipe (H<sub>2</sub> Ar 200C) Parameters]] |
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*[[media:17-InP%26InGaAs_etch-Cl2H2Ar-Unaxis-VLR.pdf|InP-InGaAs Etch Profile (H<sub>2</sub> Ar 200C)]] |
*[[media:17-InP%26InGaAs_etch-Cl2H2Ar-Unaxis-VLR.pdf|InP-InGaAs Etch Profile (H<sub>2</sub> Ar 200C)]] |
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Revision as of 16:16, 23 October 2013
Back to Dry Etching Recipes.