ICP Etching Recipes: Difference between revisions
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==AlGaAs Etch (Panasonic 1)== |
==AlGaAs Etch (Panasonic 1)== |
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*[[media:12-Plasma_Etching_of_AlGaAs-Panasonic_ICP-1-Etcher.pdf|AlGaAs Etch Recipes]] |
*[[media:12-Plasma_Etching_of_AlGaAs-Panasonic_ICP-1-Etcher.pdf|AlGaAs Etch Recipes - Cl<sub>2</sub>N<sub>2</sub>]] |
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==GaN Etch (Panasonic 1)== |
==GaN Etch (Panasonic 1)== |
Revision as of 16:27, 23 October 2013
Back to Dry Etching Recipes.
Si Deep RIE (PlasmaTherm/Bosch Etch)
Single-step Si Etching (not Bosch Process!) (Si Deep RIE)
ICP Etch 1 (Panasonic E626I)
SiO2 Etching (Panasonic 1)
SiNx Etching (Panasonic 1)
Al Etch (Panasonic 1)
Cr Etch (Panasonic 1)
Ti Etch (Panasonic 1)
AlGaAs Etch (Panasonic 1)
GaN Etch (Panasonic 1)
ICP Etch 2 (Panasonic E640)
SiO2 Etching (Panasonic 2)
SiNx Etching (Panasonic 2)
Al Etch (Panasonic 2)
GaAs Etch (Panasonic 2)
ICP-Etch (Unaxis VLR)
GaAs-AlGaAs Etch (Unaxis VLR)
InP-InGaAs-InAlAs Etch (Unaxis VLR)
- InP Etch Recipe (Cl2N2Ar 200C)
- InP-based Material Etch Profile (Cl2N2Ar200C)
- Unaxis InP Etch Recipe (Cl2H2 Ar 200C) Parameters
- InP-InGaAs Etch Profile (Cl2H2 Ar 200C)