ICP Etching Recipes: Difference between revisions
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==Ti Etch (Panasonic 1)== |
==Ti Etch (Panasonic 1)== |
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*[[media:Panasonic-1-Ti-Etch-Deep-RevA.pdf|Ti Deep Etch Recipes - Cl<sub>2</sub>Ar]] |
*[[media:Panasonic-1-Ti-Etch-Deep-RevA.pdf|Ti Deep Etch Recipes - Cl<sub>2</sub>Ar]] |
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==W-TiW Etch (Panasonic 1)== |
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*[[media:Panasonic1-TiW-W-Etch-Plasma-RIE-RevA.pdf|Ti-TiW Etch Recipes - SF<sub>6</sub>Ar]] |
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==AlGaAs Etch (Panasonic 1)== |
==AlGaAs Etch (Panasonic 1)== |
Revision as of 23:11, 23 October 2013
Back to Dry Etching Recipes.
Si Deep RIE (PlasmaTherm/Bosch Etch)
Single-step Si Etching (not Bosch Process!) (Si Deep RIE)
ICP Etch 1 (Panasonic E626I)
SiO2 Etching (Panasonic 1)
SiNx Etching (Panasonic 1)
Al Etch (Panasonic 1)
Cr Etch (Panasonic 1)
Ti Etch (Panasonic 1)
W-TiW Etch (Panasonic 1)
AlGaAs Etch (Panasonic 1)
GaN Etch (Panasonic 1)
ICP Etch 2 (Panasonic E640)
SiO2 Etching (Panasonic 2)
SiNx Etching (Panasonic 2)
Al Etch (Panasonic 2)
GaAs Etch (Panasonic 2)
ICP-Etch (Unaxis VLR)
GaAs-AlGaAs Etch (Unaxis VLR)
InP-InGaAs-InAlAs Etch (Unaxis VLR)
- InP Etch Recipe (Cl2N2Ar 200C)
- InP-based Material Etch Profile (Cl2N2Ar200C)
- Unaxis InP Etch Recipe (Cl2H2 Ar 200C) Parameters
- InP-InGaAs Etch Profile (Cl2H2 Ar 200C)