Molecular Vapor Deposition: Difference between revisions

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{{tool|{{PAGENAME}}
{{tool2|{{PAGENAME}}
|picture=MVD.jpg
|picture=MVD.jpg
|type = Vacuum Deposition
|type = Vacuum Deposition
|super= Lee Sawyer
|super= Lee Sawyer
|super2= Aidan Hopkins
|phone=(805) 893-2123
|phone=(805) 893-2123
|location=Bay 4
|location=Bay 4
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|materials =
|materials =
}}
}}
= About =
==About==
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.


== Recipes ==
==Recipes==

* [https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer
*[https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer
*[https://signupmonkey.ece.ucsb.edu/wiki/images/3/3c/MVD_Standard_Recipes.pdf MVD Standard Recipes]

==Documentation==

*[https://signupmonkey.ece.ucsb.edu/wiki/images/f/f4/MVD_SOP.pdf MVD Standard Operating Procedure]
*[[MVD - Wafer Coating - Process Traveler|Wafer Coating - Process Traveler]]

Latest revision as of 17:34, 30 August 2022

Molecular Vapor Deposition
MVD.jpg
Location Bay 4
Tool Type Vacuum Deposition
Manufacturer Applied Microstructures Inc.
Description Molecular Vapor Deposition System
Primary Supervisor Lee Sawyer
(805) 893-2123
lee_sawyer@ucsb.edu

Secondary Supervisor

Aidan Hopkins

Recipes Vacuum Deposition Recipes


About

The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.

Recipes

Documentation

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