Molecular Vapor Deposition

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Molecular Vapor Deposition
Location Bay 4
Tool Type Vacuum Deposition
Manufacturer Applied Microstructures Inc.
Description Molecular Vapor Deposition System

Primary Supervisor Lee Sawyer
(805) 893-2123

Secondary Supervisor

Aidan Hopkins

Recipes Vacuum Deposition RecipesN/A


The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.