Mike Silva: Difference between revisions
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*[[High Temp Oven (Blue M)]] |
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*[[Sputter 5 (Lesker AXXIS)]] |
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*[[Ion Beam Deposition (Veeco NEXUS)]] |
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*[[ICP Etch 2 (Panasonic E640)]] |
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*[[Plasma Clean (Gasonics 2000)]] |
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*[[HF Vapor Etch]] |
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* [[Tube Furnace Wafer Bonding (Thermco)]] |
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* [[Step Profilometer (Dektak 6M)]] |
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* [[Film Stress (Tencor Flexus)]] |
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* [[Optical Film Thickness (Nanometric)]] |
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Latest revision as of 15:31, 14 April 2023
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About
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Current Work
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Tools
Mike Silva is in charge of the following tools: