Dry Etching Recipes: Difference between revisions

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{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" class="collapsible wikitable"
{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" class="collapsible wikitable"
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! width="725" height="45" colspan="10" | <div style="font-size: 150%;">Dry Etching Recipes</div>
! width="725" height="45" colspan="15" | <div style="font-size: 150%;">Dry Etching Recipes</div>
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| <!-- INTENTIONALLY LEFT BLANK -->
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!height="35" width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[RIE Etching Recipes|RIE Etching]]'''
! width="300" bgcolor="#D0E7FF" align="center" height="35" colspan="4" | '''[[RIE Etching Recipes|RIE Etching]]'''
! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[ICP Etching Recipes|ICP Etching]]'''
! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[ICP Etching Recipes|ICP Etching]]'''
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!width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
! width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
|width="65" bgcolor="#DAF1FF" | [[RIE 1 (Custom)|RIE 1<br>(Custom)]]
| width="65" bgcolor="#DAF1FF" | [[RIE 1 (Custom)|RIE 1<br>(Custom)]]
|width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
| width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
|width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
| width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
|width="95" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
| width="95" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
|width="160" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
| width="160" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
|width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic E626I)]]
| width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic E626I)]]
|width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic E640)]]
| width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic E640)]]
|width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
| width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
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! bgcolor="#D0E7FF" align="center" | Al
! bgcolor="#D0E7FF" align="center" | Al
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! bgcolor="#D0E7FF" align="center" | Ge
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! bgcolor="#D0E7FF" align="center" | Ag
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! bgcolor="#D0E7FF" align="center" | Ru
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! bgcolor="#D0E7FF" align="center" | Mo
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! bgcolor="#D0E7FF" align="center" | Ta
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! bgcolor="#D0E7FF" align="center" | Al<sub>2</sub>O<sub>3</sub>
! bgcolor="#D0E7FF" align="center" | Al<sub>2</sub>O<sub>3</sub>
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! bgcolor="#D0E7FF" align="center" | HfO<sub>2</sub>
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! bgcolor="#D0E7FF" align="center" | ITo
! bgcolor="#D0E7FF" align="center" | ITo
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! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub>
! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub>
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! bgcolor="#D0E7FF" align="center" | SiN
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! bgcolor="#D0E7FF" align="center" | SiOxNy
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! bgcolor="#D0E7FF" align="center" | Ta<sub>2</sub>O<sub>5</sub>
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! bgcolor="#D0E7FF" align="center" | TiO<sub>2</sub>
! bgcolor="#D0E7FF" align="center" | TiO<sub>2</sub>
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! bgcolor="#D0E7FF" align="center" | TiN
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! bgcolor="#D0E7FF" align="center" | ZnO<sub>2</sub>
! bgcolor="#D0E7FF" align="center" | ZnO<sub>2</sub>
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! bgcolor="#D0E7FF" align="center" | ZrO<sub>2</sub>
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! bgcolor="#D0E7FF" align="center" | GaAs
! bgcolor="#D0E7FF" align="center" | GaAs
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! bgcolor="#D0E7FF" align="center" | AlGaAs
! bgcolor="#D0E7FF" align="center" | AlGaAs
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! bgcolor="#D0E7FF" align="center" | InGaAlAs
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! bgcolor="#D0E7FF" align="center" | InGaAsP
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! bgcolor="#D0E7FF" align="center" | InP
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! bgcolor="#D0E7FF" align="center" | GaN
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! bgcolor="#D0E7FF" align="center" | AlGaN
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! bgcolor="#D0E7FF" align="center" | AlN
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! bgcolor="#D0E7FF" align="center" | GaN
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! bgcolor="#D0E7FF" align="center" | AlGaN
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! bgcolor="#D0E7FF" align="center" | GaSb
! bgcolor="#D0E7FF" align="center" | GaSb
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! bgcolor="#D0E7FF" align="center" | CdTe
! bgcolor="#D0E7FF" align="center" | CdTe
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! bgcolor="#D0E7FF" align="center" | ZnSe
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! bgcolor="#D0E7FF" align="center" | Si
! bgcolor="#D0E7FF" align="center" | Si
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! bgcolor="#D0E7FF" align="center" | SiC
! bgcolor="#D0E7FF" align="center" | SiC
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! bgcolor="#D0E7FF" align="center" | Sapphire
! bgcolor="#D0E7FF" align="center" | Sapphire
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Revision as of 20:48, 18 July 2012

Dry Etching Recipes
RIE Etching ICP Etching
Material RIE 1
(Custom)
RIE 2
(MRC)
RIE 3
(MRC)
RIE 5
(PlasmaTherm)
Si Deep RIE
(PlasmaTherm/Bosch Etch)
ICP Etch 1
(Panasonic E626I)
ICP Etch 2
(Panasonic E640)
ICP-Etch
(Unaxis VLR)
Al
Ti
Cr
Ge
Ag
Ru
Mo
Ta
W
Al2O3
HfO2
ITo
SiO2
SiN
SiOxNy
Ta2O5
TiO2
TiN
ZnO2
ZrO2
GaAs
AlGaAs
InGaAlAs
InGaAsP
InP
GaN
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdTe
ZnSe
Si
SiC
Sapphire