Filmetrics F40-UV Microscope-Mounted: Difference between revisions
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<!-- [[File:Filmetrics F40-UV - system pic 01.jpg|alt=Photograph of the system.|thumb|300x300px|Photograph of the F40-UV microscope.]] --> |
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== About == |
== About == |
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== Operating Procedures == |
== Operating Procedures == |
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* [[Filmetrics F40-UV Quick Start|Quick Start Procedure]] |
* [[Filmetrics F40-UV Quick Start|Quick Start Procedure]] |
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== Screenshots + Examples == |
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[[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG|alt=example spectrum curve fit|none|thumb|500x500px|Screenshot showing microscope view and optical spectrum/curve fitting of the film thickness.]] |
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[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg|alt=example spectrum curve fit|none|thumb|300x300px|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]] |
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Revision as of 06:27, 22 May 2019
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About
The Filmetrics F40-UV is a microscope-mounted thin-film measurement system, allowing you to non-destructively measure thin-film thicknesses in small (patterned) areas on your sample. It is an optical reflectometer, acquiring reflection spectra between 400-900nm optical wavelengths (Vis to Near-IR) with a regular halogen microscope light source. The Filmetrics software then performs curve-fitting to determine the thickness and/or refractive index of the measured films.
Capabilities
- Measure optically transparent thin-films down to ~30nm thickness.
- Microscope Objectives: 10x, 20x, 50x, 100x, 150x
- Acquire Optical Reflection Spectra from 400-900nm
- Spectrometer/Detector is capable of detecting down to UV ~190nm, but light source does not support this wavelength.
- Reflectivity curve-fitting for thin-film thickness analysis, supporting many common materials (Si3N4, SiO2 dielectrics, Si, GaAs, InP semiconductors, metals, photoresists etc.)
