Filmetrics F40-UV Microscope-Mounted

Filmetrics F40-UV Microscope-Mounted Tool Type Inspection,_Test_and_Characterization Location Bay #4 Supervisor Ning Cao Supervisor Phone (805) 893-4689 Supervisor E-Mail ningcao@ece.ucsb.edu Description Measures thin-film thickness/index in small regions via optical reflectometry through a microscope. Manufacturer Filmetrics Inc. Model F40-UV

About

The Filmetrics F40-UV is a microscope-mounted thin-film measurement system, allowing you to non-destructively measure thin-film thicknesses in small (patterned) areas on your sample. It is an optical reflectometer, acquiring reflection spectra between 400-900nm optical wavelengths (Vis to Near-IR) with a regular halogen microscope light source. The Filmetrics software then performs curve-fitting to determine the thickness and/or refractive index of the measured films.

Capabilities

• Measure optically transparent thin-films down to ~30nm thickness.
• Microscope Objectives: 10x, 20x, 50x, 100x, 150x
• Acquire Optical Reflection Spectra from 400-900nm
• Spectrometer/Detector is capable of detecting down to UV ~190nm, but light source does not support this wavelength.
• Reflectivity curve-fitting for thin-film thickness analysis, supporting many common materials (Si₃N₄, SiO₂ dielectrics, Si, GaAs, InP semiconductors, metals, photoresists etc.)

Operating Procedures

• Quick Start Procedure

Screenshots + Examples

Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal.

A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.

Using the F40-UV to check whether a dry etch is complete.

Incomplete Dry-Etch, showing some residual SiO2 left.	After re-etching, measurement shows bad fit (red and blue curves), indicating the SiO2 film has been fully removed.