Surface Analysis (KLA/Tencor Surfscan): Difference between revisions

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== Examples ==
==Examples==
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(1.60µm – 28.0µm)
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|[[File:Surfscan - 230113A7 Gain4 high particles.jpg|frameless|199x199px]]
|''To Be Added''
|[[File:Surfscan 230113A7G2 after low particles.jpg|frameless|195x195px]]
|''To Be Added''
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Revision as of 06:37, 6 June 2023

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Location Bay 5
Tool Type Inspection, Test and Characterization
Manufacturer Tencor
Description Surface Analysis 
KLA/Tencor Surfscan
Primary Supervisor Biljana Stamenic
(805) 893-4002
biljana@ece.ucsb.edu

Secondary Supervisor

Don Freeborn

Recipes


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.

Documentation


Examples


A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan - 230113A7 Gain4 high particles.jpg Surfscan 230113A7G2 after low particles.jpg
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