Lithography Recipes: Difference between revisions

Revision as of 23:33, 10 July 2013

R = Recipe is available. Clicking this link will take you to the recipe.

@@ Line 25: / Line 25: @@
 *{{fl|AZnLOF2020-Negative-Resist-Datasheet.pdf|AZnLOF2000 (AZnLOF2020, AZnLOF2035, AZnLOF2070)}}
 *{{fl|UVN2300-Negative-Resist-Datasheet.pdf|UVN2300-0.5}}
+*{{fl|xxxx.pdf|SU-8-2015 and 2075}}
 ;Underlayers
@@ Line 36: / Line 37: @@
 *{{fl|maN2403-E-Beam-Resist-Datasheet.pdf|maN 2403}}
-|
 ;Nanoimprinting
 *{{fl|NX1020-Nanoimprinting-Datasheet.pdf|NX1020}}
 *{{fl|MRI-7020-Nanoimprinting-Datasheet.pdf|MRI-7020}}
+|
 ;Contrast Enhancement Materials
@@ Line 51: / Line 51: @@
 *{{fl|AR2-Anti-Reflective-Coating.pdf|AR2}}
 *{{fl|DS-K101-Anti-Reflective-Coating.pdf|DS-K101 (developable BARC)}}
+;Adhesion Promoters
+*{{fl|xxxx.pdf|HMDS}}
+*{{fl|xxxx.pdf|AP3000 BCB Adhesion Promoter}}
+*{{fl|xxxx.pdf|Omnicoat, SU-8 Adhesion Promoter}}
+;BCB and SOG
+*{{fl|xxxx.pdf|BCB, Cyclotene 3022-46(Not Photosensitive)}}
+*{{fl|xxxx.pdf|PhotoBCB, Cyclotene 4022-40(Negative Polarity)}}
+*{{fl|xxxx.pdf|Spin-on-Glass, Honeywell 512B (Not Photosensitive)}}
 ;Developers
@@ Line 56: / Line 68: @@
 *{{fl|AZ400K-Developer-Datasheet.pdf|AZ400K (AZ400K, AZ400K1:4)}}
 *{{fl|AZ300MIF-Developer-Datasheet.pdf|AZ300MIF}}
+*{{fl|xxxxxx.pdf|DS2100 BCB Developer}}
+*{{fl|xxxxxx.pdf|SU-8 Developer}}
+*{{fl|xxxxxx.pdf|101A Developer (for DUV Flood Exposed PMGI)}}
 ;Photoresist Removers
@@ Line 62: / Line 77: @@
 *{{fl|AZ300T-Resist-Remover.pdf|AZ300T}}
 *{{fl|PRX-127-Resist-Remover.pdf|PRX-127}}
+*{{fl|xxxx.pdf|Remover PG, SU-8 stripper}}
 |}