Ion Beam Deposition (Veeco NEXUS)

Ion Beam Deposition (Veeco NEXUS) Tool Type Vacuum Deposition Location Bay 3 Supervisor Mike Silva Supervisor Phone (805) 893-3096 Supervisor E-Mail silva@ece.ucsb.edu Description Ion Beam Deposition Tool Manufacturer Veeco Vacuum Deposition Recipes Sign up for this tool

About

This tool is designed for high quality, precise, reproducible deposition of dielectric films for optical quality films. Metallic material is ion bombarded from a target material and a reactive ion beam of oxygen and/or nitrogen is aimed at the surface, creating a metal-oxide or nitride on the sample. The system is fully computer controlled to facilitate multi-layer stack recipes for high reflectivity or low reflectivity coatings. The system is load locked and can handle wafers up to 6” in diameter as well as small pieces. Sample rotation and angling is used to facilitate material quality and allows for sidewall coverage on non-planar surfaces. Uniformity is better than 1.5% over 6" wafers and reproducibility is expected to be within one percent (with pre-dep calibration). The high-energy sputter deposition produces denser films than other techniques, improving optical damage threshold (and thus coating lifetime). This also causes the refractive indices to be slightly higher than comparable stoichiometric films deposited by other techniques.

Four metallic targets can be installed (producing Oxides & Nitrides of each). Ta & Si are always available, the others are rotated out as users need them.

The most common films for High-/Anti-Reflection (HR/AR) coatings are SiO₂ & Ta₂O₅, both of which are extremely stable w/r/to refractive index. Users typically calibrate their dep. rates prior to critical deps. & multi-layer coatings.

Detailed Specifications

• Xenon target bombardment
• Nitrogen and/or Oxygen deposition assist source for metal oxides/nitrides
• Targets: Ta, Si, Al, Ti, ITO
• Pieces up to 6” wafers accepted
• Full programmable control through GUI for multi-layer optical coatings
• Standard Recipes: Ta₂O₅ (1.33 A/s rate), SiO₂ (0.85A/s), Si₃N₄, TiO₂.
  • Custom recipes: Al₂O₃, SiO_xN_y, AlN, TaN
• Base Pressure ≤ 3e-8 Torr
• High quality, High Reflectivity DBR (>99.5%) mirrors demonstrated in blue wavelengths
• Wide-band Anti-Reflection coatings demonstrated in near-IR (~1550nm)

Documentation

• Operating Instructions
• Sputtering Recipes: Ion Beam Deposition (Veeco NEXUS)