ICP Etching Recipes: Difference between revisions
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=[[ICP Etch 1 (Panasonic E626I)]]= |
=[[ICP Etch 1 (Panasonic E626I)]]= |
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==SiO<sub>2</sub> Etching (Panasonic 1)== |
==SiO<sub>2</sub> Etching (Panasonic 1)== |
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*[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] |
*[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe Parameters]] |
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*[[media:Panasonic1-SiO2-Data-Process-Variation-CHF3-revA.pdf|SiO<sub>2</sub> CHF3 Etch Variations]] |
*[[media:Panasonic1-SiO2-Data-Process-Variation-CHF3-revA.pdf|SiO<sub>2</sub> CHF3 Etch Variations]] |
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Revision as of 18:00, 27 September 2013
Back to Dry Etching Recipes.