Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer): Difference between revisions

Content deleted Content added

Inline

Revision as of 23:43, 6 March 2019

Revision as of 23:34, 6 March 2019 view source Ningcao (talk \| contribs) staff, Administrators 1,044 edits add data Tag: Visual edit ← Older edit		Revision as of 23:43, 6 March 2019 view source Ningcao (talk \| contribs) staff, Administrators 1,044 edits add a pic Tag: Visual edit Newer edit →
Line 29: \|0.80 \|79.4 \|[https://www.nanotech.ucsb.edu/wiki/images/d/dc/SiO2_Etch_using_ICP2_with_O2-3-06-2019.pdf] \| \|}