Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"
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=About= |
=About= |
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+ | This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. |
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=Documentation= |
=Documentation= |
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*[[media:Surfscan-Operation-Manual.pdf|Operations Manual]] |
*[[media:Surfscan-Operation-Manual.pdf|Operations Manual]] |
Revision as of 14:20, 10 July 2015
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About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.