Automated Coat/Develop System (S-Cubed Flexi): Difference between revisions
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'''This tool is only available for Staff use at this time.''' |
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=About= |
=About= |
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*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]]) |
*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]]) |
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*See the [https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists. |
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=Operating Procedures= |
=Operating Procedures= |
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Revision as of 23:03, 8 October 2019
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This tool is only available for Staff use at this time.
About
To Be Added
Detailed Specifications
- Wafer Size: 100mm (150mm possible but not set up)
- PR Coating Properties:
- Uniformity < 1.0%
- < 100 particles on 100mm wafer
- Photoresists/Underlayers Available:
- UV6-0.8
- DS-K101-304
- PMMA
- PMGI SF11
- PMGI SF5
- Solvents Available:
- EBR100
- Developers Available:
- AZ 300 MiF
Process Information
- Recipe Page for S-Cubed Coater: Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi)
- See the Photolith. Chemicals page for info on the installed resists.
Operating Procedures
- To Be Added