S-Cubed Flexi - Operating Procedure: Difference between revisions

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(inital procedure, and initial recipes)
(link to DSK bake vs dev rate, recipe minor updates)
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Processes currently available to lab users:
Processes currently available to lab users:


* DS-K101 BARC (can be used like DUV42P)
*DS-K101 BARC (can be used like DUV42P)
**[[DS-K101-304 Bake Temp. versus Develop Rate|See this table of develop rate vs. bake temp for DS-K101]]
* UV6 Positive DUV Resist
*UV6 Positive DUV Resist
⚫
* ''(PMGI and PMMA not yet available for general use)''
**Various spin speeds available.
⚫
*''(PMGI and PMMA not yet available for general use)''


===Initial===
===Initial===


* Make sure system is not running a process - Lot view shows no wafers or batches running.
*Make sure system is not running a process - Lot view shows no wafers or batches running.


* Check liquid supplies
*Check liquid supplies
** Check PR + EBR bottles by weight (lift by hand).  Replace EBR if needed, just unscrew and put into new bottle. If PR bottle empty (see large bubbles in tube) let TonyB/SeanD know, <u>not user replaceable</u>.
**Check PR + EBR bottles by weight (lift by hand).  Replace EBR if needed, just unscrew and put into new bottle. If PR bottle empty (see large bubbles in tube) let TonyB/SeanD know, <u>not user replaceable</u>.


(If running PMGI, check if nozzles cleaned)
(If running PMGI, check if nozzles cleaned)


* Check PR nozzle "bath" - make sure it's not clogged (should have a bit of liquid, but not above drain hole).  If it does, use wooden stick of swab to unclog.
*Check PR nozzle "bath" - make sure it's not clogged (should have a bit of liquid, but not above drain hole).  If it does, use wooden stick of swab to unclog.


* Check if hot plates are set to the needs temperatures. If not, run Temp-change recipe:
*Check if hot plates are set to the needs temperatures. If not, run Temp-change recipe:


# Load dummy wafer (clean underside)
#Load dummy wafer (clean underside)
# run recipe: Staff>SET-<HP#>-<TEMP> recipe corresponding to needed temp.
#run recipe: Staff>SET-<HP#>-<TEMP> recipe corresponding to needed temp.
## Eg. '''Staff > SET-HP4-220C''' will set hotplate 4 to 220°C
##Eg. '''Staff > SET-HP4-220C''' will set hotplate 4 to 220°C
# Check that hotplate reach desired temp.(will overshoot by ~2-3°C)
#Check that hotplate reach desired temp.(will overshoot by ~2-3°C)
# After 5min bake, need +/-2°C before running process.
#After 5min bake, need +/-2°C before running process.


=== Run Wafers ===
===Run Wafers===


* Load test "mechanical" wafer - run a test run of your desired recipe, make sure spin looks ok.  Important for first UV6 run after >6hrs idle.  1st Mechanical wafer will likely show radial nonuniformity as dried PR is ejected.  2nd test wafer should spin with high uniformity.
*Load test "mechanical" wafer - run a test run of your desired recipe, make sure spin looks ok.  Important for first UV6 run after >6hrs idle.  1st Mechanical wafer will likely show radial nonuniformity as dried PR is ejected.  2nd test wafer should spin with high uniformity.


* Load your wafers into Left Cassette, run your Route.  Use filter ONLY [Staff].
*Load your wafers into Left Cassette, run your Route.  Use filter ONLY [Staff].


<br />
<br />


=== Allowed Recipes ===
===Allowed Recipes===
{| class="wikitable"
{| class="wikitable"
|+''Ask [[Tony Bosch|Staff]] if you need a new recipe.''
|+''Ask [[Tony Bosch|Staff]] if you need a new recipe.''
|'''<u>Coating Material</u>'''
|
|'''<u>Route/Chain</u>'''
|'''<u>Route/Chain</u>'''
|'''<u>Name</u>'''
|'''<u>Name</u>'''
Line 45: Line 47:
|'''<u>Notes</u>'''
|'''<u>Notes</u>'''
|-
|-
|'''DS-K101 recipes'''
|'''DS-K101'''
|Route
|Route
|Coat-DS-K101-304[5Krpm]-185C
|Coat-DS-K101-304[5Krpm]-185C
|
|
|
|
|Requires: HP4=185°C
|

• [[DS-K101-304 Bake Temp. versus Develop Rate|DSK Bake vs. Dev rate]]
|-
|-
|'''UV6 Recipes'''
|'''UV6-0.8'''
|Route
|Route
|Staff > Coat-UV6[3.5K]-135C
|Staff > Coat-UV6[3.5K]-135C
|3.5krpm
|3.5krpm
|135°C
|135°C
|Requires: HP1=135°C
|
|-
|-
|'''DS-K101 + UV6 Recipes'''
|'''DS-K101 + UV6'''
|Chain
|Chain
|Staff > Coat-DSK101[5K]-220C-UV6[3.5K]-135C
|Staff > Coat-DSK101[5K]-220C-UV6[3.5K]-135C
Line 66: Line 70:
|DSK: 220°C
|DSK: 220°C
UV6: 135°C
UV6: 135°C
|Requires:
|

– HP4=220°C

– HP1=135°C

Plan for ~10-15 min per wafer.
|-
|-
|'''Hotplate Set recipes'''
|'''Hotplate Set'''
|Route
|Route
|SET-HP4-220C
|SET-HP4-220C
|
|
|
|
|Check that hotplate 4 (top) is between 218-222°C when done.
|Hotplate 4 (top) between 218-222°C when done.
|-
|-
|
|

Revision as of 23:13, 2 May 2022

UnderConstruction.jpg

Work In Progress

This article is still under construction. It may contain factual errors. Content is subject to change. 


Only staff & designated maintenance users are allowed to write recipes on this tool!  
Maintaining low particle counts on this tool is extremely important, so users must strictly follow the training procedures. The Underside of your wafers must be clean to avoid contamination!

Processes currently available to lab users:

Initial

  • Make sure system is not running a process - Lot view shows no wafers or batches running.
  • Check liquid supplies
    • Check PR + EBR bottles by weight (lift by hand).  Replace EBR if needed, just unscrew and put into new bottle. If PR bottle empty (see large bubbles in tube) let TonyB/SeanD know, not user replaceable.

(If running PMGI, check if nozzles cleaned)

  • Check PR nozzle "bath" - make sure it's not clogged (should have a bit of liquid, but not above drain hole).  If it does, use wooden stick of swab to unclog.
  • Check if hot plates are set to the needs temperatures. If not, run Temp-change recipe:
  1. Load dummy wafer (clean underside)
  2. run recipe: Staff>SET-<HP#>-<TEMP> recipe corresponding to needed temp.
    1. Eg. Staff > SET-HP4-220C will set hotplate 4 to 220°C
  3. Check that hotplate reach desired temp.(will overshoot by ~2-3°C)
  4. After 5min bake, need +/-2°C before running process.

Run Wafers

  • Load test "mechanical" wafer - run a test run of your desired recipe, make sure spin looks ok.  Important for first UV6 run after >6hrs idle.  1st Mechanical wafer will likely show radial nonuniformity as dried PR is ejected.  2nd test wafer should spin with high uniformity.
  • Load your wafers into Left Cassette, run your Route.  Use filter ONLY [Staff].


Allowed Recipes

Ask Staff if you need a new recipe.
Coating Material Route/Chain Name Spin Speed Bake Temp Notes
DS-K101 Route Coat-DS-K101-304[5Krpm]-185C Requires: HP4=185°C

• DSK Bake vs. Dev rate

UV6-0.8 Route Staff > Coat-UV6[3.5K]-135C 3.5krpm 135°C Requires: HP1=135°C
DS-K101 + UV6 Chain Staff > Coat-DSK101[5K]-220C-UV6[3.5K]-135C DSK: 5krpm

UV6: 3.5krpm

DSK: 220°C

UV6: 135°C

Requires:

– HP4=220°C

– HP1=135°C

Plan for ~10-15 min per wafer.

Hotplate Set Route SET-HP4-220C Hotplate 4 (top) between 218-222°C when done. 
NEVER RUN DEVELOPER RECIPES on this machine!

The developer recipes are prone to damage the hardware if not handled correctly - system is NOT AVAILABLE for automated develop at this time.
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