Spin Rinse Dryer (SemiTool): Difference between revisions
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{{tool2|{{PAGENAME}} |
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|picture=SpinRinse.jpg |
|picture=SpinRinse.jpg |
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|type = Wet Processing |
|type = Wet Processing |
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|super= |
|super= Michael Barreraz |
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|super2= Don Freeborn |
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|location=Bay 5 |
|location=Bay 5 |
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|description = ? |
|description = ? |
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Latest revision as of 18:02, 30 August 2022
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Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.
Each has a dedicated cassette that can hold up to 25 wafers.
The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.