Maskless Aligner (Raith PicoMaster XF)

Maskless Aligner (Raith PicoMaster XF) File:XYZ.jpg Location Bay 6 Tool Type Lithography Manufacturer Raith Gmbh Model Picomaster XF 200 Description Direct-Write (Maskless) I-Line Photolithography Primary Supervisor Biljana Stamenic (805) 893-4002 biljana@ece.ucsb.edu Secondary Supervisor Lee Sawyer Materials I-Line Photoresists Recipes SignupMonkey: Sign up for this tool

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Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change.

About

The Raith PicoMaster XF 200 allows for arbitrary direct-write patterning of I-Line photoresists from an uploaded CAD drawing/file (GDS, DXF, CIF etc.). The system uses a Grating Light Valve ("GLV") for patterning the exposure light-field, to programmatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.

Depending on the exposure options and write area, the PicoMaster is able to expose a 100mm wafer in about 60min, and achieves minimum features sizes around 0.5µm, with overlay/alignment accuracy better than 200nm.

Detailed Specifications

• Maximum Writeable Area: TBD
• Substrate size: 200mm round down to 1cm pieces
• Wafer / substrate thickness: Max. / Min. TBD
• Exposure optics:
  • Digital micromirror device (DMD)
  • Laser: 405nm
  • Lens NA = TBD
• Alignment Accuracy: Global ≤ 500nm; Local ("Field") ≤ 250nm
• Linewidth variation: ≤100nm (relevant to stitched exposure fields)
• Minimum Features: ~0.40µm line/space demonstrated with 0.5µm-thick PR. Requires additional effort. ≥1µm is relatively straightforward.
• Write Grid (Address Unit): TBD

• Additional manufacturer options:
  • Backside alignment

Operating Procedures

Standard Operating Procedures

• PicoMaster XF 200- Standard Operating Procedure - updated Sept 26th 2026
  • Includes File-upload procedure, CAD Conversion, Exposure and Alignment.
  • User manuals are available at the tool and on the tool's computer.

Training Procedure

To get authorized on this tool:

Request Training

Design Info - CAD layout

• Design Guidelines + Tips - Important info for designing your CAD files, alignment marks etc.
• CAD Files and Templates - example CAD designs and useful CAD structures.

Recipes

• Recipes > Lithography > Direct-Write_Lithography_Recipes#Maskless_Aligner_(Raith_PicoMasterXF)
  • Starting recipes for various I-Line photoresists

Calibrate your own Litho process

• Use Series mode exposure for doing an FEM ("Focus-Exposure Matrix") on the MLA150.
• Lithography Calibration - Analyzing a Focus-Exposure Matrix - how to analyze an FEM for repeatable processes

Litho. recipes for all our photolith. tools can be found on the Photolithography Recipes page.